COLUMNAR STRUCTURED MATERIAL AND METHOD OF MANUFACTURING THE SAME

A method of forming, on a substrate, minute-sized columnar portions of a columnar structured material at minute intervals, and a columnar structured material formed by the manufacturing method. A columnar structured material is formed through an etching process in which a pattern of minute dots form...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KURIYAMA, AKIRA, OKURA, HIROSHI, OGAWA, MIKI, DEN, TOHRU, OTTO, ALBRECHT, MIYATA, HIROKATSU, FUKUTANI, KAZUHIKO
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MANUFACTURE OR TREATMENT THEREOF MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS NANOTECHNOLOGY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	A method of forming, on a substrate, minute-sized columnar portions of a columnar structured material at minute intervals, and a columnar structured material formed by the manufacturing method. A columnar structured material is formed through an etching process in which a pattern of minute dots formed on the substrate is utilized as a mask. The pattern of the minute dots is obtained by introducing a mask material into columnar microholes of a porous film formed on the substrate and then removing the porous film. The porous film is formed by removing columnar substances from a structured material in which the columnar substances which are so formed as to contain a first component are dispersed in a matrix which is made of another component and is so formed as to contain a second component that can form a eutectic together with the first component. La présente invention concerne un procédé pour produire, sur un substrat, des parties en colonne minuscules d'un matériau à structure en colonne à des intervalles minuscules, ainsi qu'un matériau à structure en colonne produit selon ce procédé. Le matériau à structure en colonne est produit au moyen d'un processus de gravure dans lequel un motif de points minuscules, formé sur le substrat, sert de masque. Le motif de points minuscules est obtenu en introduisant un matériau de masque dans des microtrous en colonne d'un film poreux formé sur le substrat, puis en retirant le film poreux. Ledit film poreux est formé par retrait de substances en colonne d'un matériau structuré dans lequel les substances en colonne conçues pour contenir un premier composant sont dispersées dans une matrice qui est constituée d'un autre composant et est conçue pour contenir un second composant pouvant former un mélange eutectique avec le premier composant.