PHOTOMASK ASSEMBLY INCORPORATING A POROUS FRAME AND METHOD FOR MAKING IT
A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reaso...
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| creator | GANGULI, RAHUL MEIXNER, D., LAURENCE ROBINSON, TROY |
| description | A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing time period, thereby removing any harmful chemicals that might be present. The frame preferably is made by a method that includes preparing a gel by a sol-gel process, drying the gel, and partially densifying the dry gel. The resulting frame has a gas permeability to oxygen or nitrogen higher than about 10 ml.mm/cm .min.MPa, an average pore size between 0.001 micrometer and 10 micrometers, and a coefficient of thermal expansion between 0.01 ppm/°C and 10 ppm/°C.
L'invention porte sur un ensemble masque photographique comprenant un cadre destiné à supporter une pellicule transparente au-dessus d'un substrat du masque photographique et formant un espace fermé pour la pellicule chevauchant le substrat. Le cadre est formé dans un matériau poreux configuré de façon à pouvoir purger l'espace de la pellicule avec un gaz inerte sur une durée de traitement raisonnable, ce qui élimine tous les produits chimiques nocifs pouvant se trouver dans cet espace. La fabrication de ce cadre s'effectue selon un procédé qui consiste à préparer un gel par un processus sol-gel, sécher le gel et densifier partiellement le gel séché. Le cadre obtenu présente une perméabilité à l'oxygène ou à l'azote supérieure à environ 10 ml.mm/cm .min.MPa, une granulométrie moyenne comprise entre 0,001 micromètre et 10 micromètres et un coefficient de dilatation thermique compris entre 0,01 ppm/ DEG C et 10 ppm/ DEG C. |
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L'invention porte sur un ensemble masque photographique comprenant un cadre destiné à supporter une pellicule transparente au-dessus d'un substrat du masque photographique et formant un espace fermé pour la pellicule chevauchant le substrat. Le cadre est formé dans un matériau poreux configuré de façon à pouvoir purger l'espace de la pellicule avec un gaz inerte sur une durée de traitement raisonnable, ce qui élimine tous les produits chimiques nocifs pouvant se trouver dans cet espace. La fabrication de ce cadre s'effectue selon un procédé qui consiste à préparer un gel par un processus sol-gel, sécher le gel et densifier partiellement le gel séché. Le cadre obtenu présente une perméabilité à l'oxygène ou à l'azote supérieure à environ 10 ml.mm/cm .min.MPa, une granulométrie moyenne comprise entre 0,001 micromètre et 10 micromètres et un coefficient de dilatation thermique compris entre 0,01 ppm/ DEG C et 10 ppm/ DEG C.</description><edition>7</edition><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COFFEE MILLS ; DECORATIVE ARTS ; DOMESTIC ARTICLES OR APPLIANCES ; ELECTROGRAPHY ; FURNITURE ; GLASS ; HOLOGRAPHY ; HOUSEHOLD OR TABLE EQUIPMENT ; HUMAN NECESSITIES ; MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES ; MATERIALS THEREFOR ; METALLURGY ; MINERAL OR SLAG WOOL ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SPECIAL DESIGNS OR PICTURES ; SPICE MILLS ; SUCTION CLEANERS IN GENERAL ; TRANSPORTING</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040910&DB=EPODOC&CC=WO&NR=2004031856A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040910&DB=EPODOC&CC=WO&NR=2004031856A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GANGULI, RAHUL</creatorcontrib><creatorcontrib>MEIXNER, D., LAURENCE</creatorcontrib><creatorcontrib>ROBINSON, TROY</creatorcontrib><title>PHOTOMASK ASSEMBLY INCORPORATING A POROUS FRAME AND METHOD FOR MAKING IT</title><description>A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing time period, thereby removing any harmful chemicals that might be present. The frame preferably is made by a method that includes preparing a gel by a sol-gel process, drying the gel, and partially densifying the dry gel. The resulting frame has a gas permeability to oxygen or nitrogen higher than about 10 ml.mm/cm .min.MPa, an average pore size between 0.001 micrometer and 10 micrometers, and a coefficient of thermal expansion between 0.01 ppm/°C and 10 ppm/°C.
L'invention porte sur un ensemble masque photographique comprenant un cadre destiné à supporter une pellicule transparente au-dessus d'un substrat du masque photographique et formant un espace fermé pour la pellicule chevauchant le substrat. Le cadre est formé dans un matériau poreux configuré de façon à pouvoir purger l'espace de la pellicule avec un gaz inerte sur une durée de traitement raisonnable, ce qui élimine tous les produits chimiques nocifs pouvant se trouver dans cet espace. La fabrication de ce cadre s'effectue selon un procédé qui consiste à préparer un gel par un processus sol-gel, sécher le gel et densifier partiellement le gel séché. Le cadre obtenu présente une perméabilité à l'oxygène ou à l'azote supérieure à environ 10 ml.mm/cm .min.MPa, une granulométrie moyenne comprise entre 0,001 micromètre et 10 micromètres et un coefficient de dilatation thermique compris entre 0,01 ppm/ DEG C et 10 ppm/ DEG C.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COFFEE MILLS</subject><subject>DECORATIVE ARTS</subject><subject>DOMESTIC ARTICLES OR APPLIANCES</subject><subject>ELECTROGRAPHY</subject><subject>FURNITURE</subject><subject>GLASS</subject><subject>HOLOGRAPHY</subject><subject>HOUSEHOLD OR TABLE EQUIPMENT</subject><subject>HUMAN NECESSITIES</subject><subject>MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MINERAL OR SLAG WOOL</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SPECIAL DESIGNS OR PICTURES</subject><subject>SPICE MILLS</subject><subject>SUCTION CLEANERS IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPAI8PAP8fd1DPZWcAwOdvV18olU8PRz9g8K8A9yDPH0c1dwVAAy_UODFdyCHH1dFRz9XBR8XUM8_F0U3PyDFHwdvUGKPEN4GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8uL-RgYGJgbGhhamZo7ExcaoAwXUttQ</recordid><startdate>20040910</startdate><enddate>20040910</enddate><creator>GANGULI, RAHUL</creator><creator>MEIXNER, D., LAURENCE</creator><creator>ROBINSON, TROY</creator><scope>EVB</scope></search><sort><creationdate>20040910</creationdate><title>PHOTOMASK ASSEMBLY INCORPORATING A POROUS FRAME AND METHOD FOR MAKING IT</title><author>GANGULI, RAHUL ; MEIXNER, D., LAURENCE ; ROBINSON, TROY</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2004031856A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COFFEE MILLS</topic><topic>DECORATIVE ARTS</topic><topic>DOMESTIC ARTICLES OR APPLIANCES</topic><topic>ELECTROGRAPHY</topic><topic>FURNITURE</topic><topic>GLASS</topic><topic>HOLOGRAPHY</topic><topic>HOUSEHOLD OR TABLE EQUIPMENT</topic><topic>HUMAN NECESSITIES</topic><topic>MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SPECIAL DESIGNS OR PICTURES</topic><topic>SPICE MILLS</topic><topic>SUCTION CLEANERS IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>GANGULI, RAHUL</creatorcontrib><creatorcontrib>MEIXNER, D., LAURENCE</creatorcontrib><creatorcontrib>ROBINSON, TROY</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GANGULI, RAHUL</au><au>MEIXNER, D., LAURENCE</au><au>ROBINSON, TROY</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOMASK ASSEMBLY INCORPORATING A POROUS FRAME AND METHOD FOR MAKING IT</title><date>2004-09-10</date><risdate>2004</risdate><abstract>A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing time period, thereby removing any harmful chemicals that might be present. The frame preferably is made by a method that includes preparing a gel by a sol-gel process, drying the gel, and partially densifying the dry gel. The resulting frame has a gas permeability to oxygen or nitrogen higher than about 10 ml.mm/cm .min.MPa, an average pore size between 0.001 micrometer and 10 micrometers, and a coefficient of thermal expansion between 0.01 ppm/°C and 10 ppm/°C.
L'invention porte sur un ensemble masque photographique comprenant un cadre destiné à supporter une pellicule transparente au-dessus d'un substrat du masque photographique et formant un espace fermé pour la pellicule chevauchant le substrat. Le cadre est formé dans un matériau poreux configuré de façon à pouvoir purger l'espace de la pellicule avec un gaz inerte sur une durée de traitement raisonnable, ce qui élimine tous les produits chimiques nocifs pouvant se trouver dans cet espace. La fabrication de ce cadre s'effectue selon un procédé qui consiste à préparer un gel par un processus sol-gel, sécher le gel et densifier partiellement le gel séché. Le cadre obtenu présente une perméabilité à l'oxygène ou à l'azote supérieure à environ 10 ml.mm/cm .min.MPa, une granulométrie moyenne comprise entre 0,001 micromètre et 10 micromètres et un coefficient de dilatation thermique compris entre 0,01 ppm/ DEG C et 10 ppm/ DEG C.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COFFEE MILLS DECORATIVE ARTS DOMESTIC ARTICLES OR APPLIANCES ELECTROGRAPHY FURNITURE GLASS HOLOGRAPHY HOUSEHOLD OR TABLE EQUIPMENT HUMAN NECESSITIES MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES MATERIALS THEREFOR METALLURGY MINERAL OR SLAG WOOL ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SPECIAL DESIGNS OR PICTURES SPICE MILLS SUCTION CLEANERS IN GENERAL TRANSPORTING |
| title | PHOTOMASK ASSEMBLY INCORPORATING A POROUS FRAME AND METHOD FOR MAKING IT |
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