METHOD AND APPARATUS FOR TREATING A SUBSTRATE WITH AN OZONE-SOLVENT SOLUTION III

A general method and apparatus for treating materials at high speed comprises the steps of dissolving a relatively high concentration ozone gas in a solvent at a relatively low predetermined temperature T1 to form an ozone-solvent solution with a relatively high dissolved ozone concentration, and he...

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description A general method and apparatus for treating materials at high speed comprises the steps of dissolving a relatively high concentration ozone gas in a solvent at a relatively low predetermined temperature T1 to form an ozone-solvent solution with a relatively high dissolved ozone concentration, and heating either the ozone-water solution or the material to be treated or both, the ozone-solvent solution and the material to be oxidized with a point-of-use heater to quickly increase the temperature to a predetermined higher temperature T2-T1, and applying the ozone-solvent solution to said material(s) whereby the heated ozone-water solution will have a much higher dissolved ozone concentration at said higher temperature, than could be achieved if the ozone gas was initially dissolved in water at said higher temperature. The liquid back-pressure regulator (158) is positioned downstream of drain outlet port (52) of materials processing module (50) and gas back-pressure regulator (180) is placed downstream of gas outlet port (62), either upstream of catalytic unit (64) or downstream of catalytic unit (64) as shown in this example. L'invention concerne un procédé et un dispositif permettant de traiter des matériaux à grande vitesse, lequel procédé comprend les étapes consistant à dissoudre une gaz ozone en concentration relativement élevée dans un solvant à une température T1 prédéterminée relativement basse afin de former une solution ozone-solvant avec une concentration d'ozone assez fortement dissoute; puis, à chauffer soit la solution ozone-eau soit le matériau devant être traité, soit les deux. La solution ozone-solvant et le matériau devant être traité étant oxydés à l'aide d'un appareil de chauffage au point d'utilisation de manière à augmenter rapidement la température à une température prédéterminée T2 supérieure à T1; à appliquer la solution ozone-solvant au(x)dit(s) matériau(x). La solution ozone-solvant chauffée présentera une concentration d'ozone dissoute plus élevée, à la température T2, que si le gaz ozone avait été dissous au départ dans l'eau à cette même température T2.
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La solution ozone-solvant et le matériau devant être traité étant oxydés à l'aide d'un appareil de chauffage au point d'utilisation de manière à augmenter rapidement la température à une température prédéterminée T2 supérieure à T1; à appliquer la solution ozone-solvant au(x)dit(s) matériau(x). La solution ozone-solvant chauffée présentera une concentration d'ozone dissoute plus élevée, à la température T2, que si le gaz ozone avait été dissous au départ dans l'eau à cette même température T2.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
APPARATUS THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES
CHEMISTRY
CINEMATOGRAPHY
CLEANING
CLEANING IN GENERAL
DISINFECTION, STERILISATION, OR DEODORISATION OF AIR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
HOLOGRAPHY
HUMAN NECESSITIES
HYGIENE
MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES
MATERIALS THEREFOR
MEDICAL OR VETERINARY SCIENCE
METALLURGY
METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PREVENTION OF FOULING IN GENERAL
PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS
SEMICONDUCTOR DEVICES
TRANSPORTING
title METHOD AND APPARATUS FOR TREATING A SUBSTRATE WITH AN OZONE-SOLVENT SOLUTION III
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