BULK GAS DELIVERY SYSTEM FOR ION IMPLANTERS

A gas delivery system (100) for an ion implantation system comprises a gas source at a first voltage potential and an ion source at a second voltage potential which is larger than the first voltage potential. The system (100) further comprises an electrically insulative connector (108) coupled betwe...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	QUILL, JAMES, PATRICK, RZESZUT, RICHARD, JOHN
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!