POLARIZATION VECTOR ALIGNMENT FOR INTERFERENCE LITHOGRAPHY PATTERNING
A polarization vector alignment technique for interference lithography generates a control signal indicating a difference in orientation between a polarization tate of an emitted optical signal and a desired linear polarization vector. The technique adjusts the linear polarization vector to enhance...
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| creator | LECLERC, MARK, A MACLEOD, BRUCE, D KELSEY, ADAM, F |
| description | A polarization vector alignment technique for interference lithography generates a control signal indicating a difference in orientation between a polarization tate of an emitted optical signal and a desired linear polarization vector. The technique adjusts the linear polarization vector to enhance the quality of the pattern produced for interference lithography.
La présente invention concerne une technique d'alignement de vecteurs de polarisation pour lithographie interférentielle générant un signal de commande indiquant une différence d'orientation entre un premier état de polarisation d'un signal optique émis et un vecteur de polarisation linéaire souhaité. La technique règle le vecteur de polarisation linéaire afin d'améliorer la qualité du diagramme réalisé pour la lithographie interférentielle. |
| format | Patent |
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La présente invention concerne une technique d'alignement de vecteurs de polarisation pour lithographie interférentielle générant un signal de commande indiquant une différence d'orientation entre un premier état de polarisation d'un signal optique émis et un vecteur de polarisation linéaire souhaité. La technique règle le vecteur de polarisation linéaire afin d'améliorer la qualité du diagramme réalisé pour la lithographie interférentielle.</description><edition>7</edition><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020906&DB=EPODOC&CC=WO&NR=02069050A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020906&DB=EPODOC&CC=WO&NR=02069050A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LECLERC, MARK, A</creatorcontrib><creatorcontrib>MACLEOD, BRUCE, D</creatorcontrib><creatorcontrib>KELSEY, ADAM, F</creatorcontrib><title>POLARIZATION VECTOR ALIGNMENT FOR INTERFERENCE LITHOGRAPHY PATTERNING</title><description>A polarization vector alignment technique for interference lithography generates a control signal indicating a difference in orientation between a polarization tate of an emitted optical signal and a desired linear polarization vector. The technique adjusts the linear polarization vector to enhance the quality of the pattern produced for interference lithography.
La présente invention concerne une technique d'alignement de vecteurs de polarisation pour lithographie interférentielle générant un signal de commande indiquant une différence d'orientation entre un premier état de polarisation d'un signal optique émis et un vecteur de polarisation linéaire souhaité. La technique règle le vecteur de polarisation linéaire afin d'améliorer la qualité du diagramme réalisé pour la lithographie interférentielle.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAN8PdxDPKMcgzx9PdTCHN1DvEPUnD08XT383X1C1FwA_I8_UJcg9xcg1z9nF0VfDxDPPzdgxwDPCIVAhxDgDJ-nn7uPAysaYk5xam8UJqbQdHNNcTZQze1ID8-tbggMTk1L7UkPtzfwMjAzNLA1MDRyJgYNQDRriy8</recordid><startdate>20020906</startdate><enddate>20020906</enddate><creator>LECLERC, MARK, A</creator><creator>MACLEOD, BRUCE, D</creator><creator>KELSEY, ADAM, F</creator><scope>EVB</scope></search><sort><creationdate>20020906</creationdate><title>POLARIZATION VECTOR ALIGNMENT FOR INTERFERENCE LITHOGRAPHY PATTERNING</title><author>LECLERC, MARK, A ; MACLEOD, BRUCE, D ; KELSEY, ADAM, F</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO02069050A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2002</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>LECLERC, MARK, A</creatorcontrib><creatorcontrib>MACLEOD, BRUCE, D</creatorcontrib><creatorcontrib>KELSEY, ADAM, F</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LECLERC, MARK, A</au><au>MACLEOD, BRUCE, D</au><au>KELSEY, ADAM, F</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POLARIZATION VECTOR ALIGNMENT FOR INTERFERENCE LITHOGRAPHY PATTERNING</title><date>2002-09-06</date><risdate>2002</risdate><abstract>A polarization vector alignment technique for interference lithography generates a control signal indicating a difference in orientation between a polarization tate of an emitted optical signal and a desired linear polarization vector. The technique adjusts the linear polarization vector to enhance the quality of the pattern produced for interference lithography.
La présente invention concerne une technique d'alignement de vecteurs de polarisation pour lithographie interférentielle générant un signal de commande indiquant une différence d'orientation entre un premier état de polarisation d'un signal optique émis et un vecteur de polarisation linéaire souhaité. La technique règle le vecteur de polarisation linéaire afin d'améliorer la qualité du diagramme réalisé pour la lithographie interférentielle.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | POLARIZATION VECTOR ALIGNMENT FOR INTERFERENCE LITHOGRAPHY PATTERNING |
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