MULTIPHOTON ABSORPTION METHOD USING PATTERNED LIGHT
Methods for producing a region of at least partially reacted material in a photoreactive composition and apparatus. The methods include: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons by the photoreactive composition;...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | FLEMING, PATRICK, R BALLEN, TODD, A LEATHERDALE, CATHERINE, A DEVOE, ROBERT, J STACEY, NICHOLAS, A DEMASTER, ROBERT, D |
| description | Methods for producing a region of at least partially reacted material in a photoreactive composition and apparatus. The methods include: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons by the photoreactive composition; providing an exposure system capable of inducing image-wise multiphoton absorption; generating a non-random three-dimensional pattern of light by means of the exposure system; and exposing the photoreactive composition to the three-dimensional pattern of light generated by the exposure system to at least partially react a portion of the material in correspondence with the non-random three-dimensional pattern of light incident thereon.
L'invention concerne des procédés de production d'une région de matière ayant au moins partiellement réagi dans une composition et un dispositif de photoréaction. Les procédés comportent les étapes consistant à : prévoir une composition photoréactive ; prévoir une source de lumière suffisante pour provoquer l'absorption simultanée d'au moins deux photons par la composition photoréactive ; prévoir un système d'exposition capable d'induire une absorption multiphotonique par image ; produire un motif lumineux non aléatoire en trois dimensions au moyen du système d'exposition ; et exposer la composition photoréactive au motif lumineux en trois dimensions produit par le système d'exposition de manière à faire réagir au moins partiellement une partie de la matière selon le motif lumineux non aléatoire en trois dimensions incident. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO0196962A2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO0196962A2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO0196962A23</originalsourceid><addsrcrecordid>eNrjZDD2DfUJ8Qzw8A_x91NwdAr2DwoI8QQyfV1DPPxdFEKDPf3cFQIcQ0Jcg_xcXRR8PN09QngYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSXy4v4GhpZmlmZGjkTERSgCQTidS</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MULTIPHOTON ABSORPTION METHOD USING PATTERNED LIGHT</title><source>esp@cenet</source><creator>FLEMING, PATRICK, R ; BALLEN, TODD, A ; LEATHERDALE, CATHERINE, A ; DEVOE, ROBERT, J ; STACEY, NICHOLAS, A ; DEMASTER, ROBERT, D</creator><creatorcontrib>FLEMING, PATRICK, R ; BALLEN, TODD, A ; LEATHERDALE, CATHERINE, A ; DEVOE, ROBERT, J ; STACEY, NICHOLAS, A ; DEMASTER, ROBERT, D</creatorcontrib><description>Methods for producing a region of at least partially reacted material in a photoreactive composition and apparatus. The methods include: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons by the photoreactive composition; providing an exposure system capable of inducing image-wise multiphoton absorption; generating a non-random three-dimensional pattern of light by means of the exposure system; and exposing the photoreactive composition to the three-dimensional pattern of light generated by the exposure system to at least partially react a portion of the material in correspondence with the non-random three-dimensional pattern of light incident thereon.
L'invention concerne des procédés de production d'une région de matière ayant au moins partiellement réagi dans une composition et un dispositif de photoréaction. Les procédés comportent les étapes consistant à : prévoir une composition photoréactive ; prévoir une source de lumière suffisante pour provoquer l'absorption simultanée d'au moins deux photons par la composition photoréactive ; prévoir un système d'exposition capable d'induire une absorption multiphotonique par image ; produire un motif lumineux non aléatoire en trois dimensions au moyen du système d'exposition ; et exposer la composition photoréactive au motif lumineux en trois dimensions produit par le système d'exposition de manière à faire réagir au moins partiellement une partie de la matière selon le motif lumineux non aléatoire en trois dimensions incident.</description><edition>7</edition><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHIC PROCESSES OR APPARATUS ; HOLOGRAPHY ; MATERIALS THEREFOR ; MICROSTRUCTURAL TECHNOLOGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS ; TRANSPORTING</subject><creationdate>2001</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20011220&DB=EPODOC&CC=WO&NR=0196962A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20011220&DB=EPODOC&CC=WO&NR=0196962A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FLEMING, PATRICK, R</creatorcontrib><creatorcontrib>BALLEN, TODD, A</creatorcontrib><creatorcontrib>LEATHERDALE, CATHERINE, A</creatorcontrib><creatorcontrib>DEVOE, ROBERT, J</creatorcontrib><creatorcontrib>STACEY, NICHOLAS, A</creatorcontrib><creatorcontrib>DEMASTER, ROBERT, D</creatorcontrib><title>MULTIPHOTON ABSORPTION METHOD USING PATTERNED LIGHT</title><description>Methods for producing a region of at least partially reacted material in a photoreactive composition and apparatus. The methods include: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons by the photoreactive composition; providing an exposure system capable of inducing image-wise multiphoton absorption; generating a non-random three-dimensional pattern of light by means of the exposure system; and exposing the photoreactive composition to the three-dimensional pattern of light generated by the exposure system to at least partially react a portion of the material in correspondence with the non-random three-dimensional pattern of light incident thereon.
L'invention concerne des procédés de production d'une région de matière ayant au moins partiellement réagi dans une composition et un dispositif de photoréaction. Les procédés comportent les étapes consistant à : prévoir une composition photoréactive ; prévoir une source de lumière suffisante pour provoquer l'absorption simultanée d'au moins deux photons par la composition photoréactive ; prévoir un système d'exposition capable d'induire une absorption multiphotonique par image ; produire un motif lumineux non aléatoire en trois dimensions au moyen du système d'exposition ; et exposer la composition photoréactive au motif lumineux en trois dimensions produit par le système d'exposition de manière à faire réagir au moins partiellement une partie de la matière selon le motif lumineux non aléatoire en trois dimensions incident.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHIC PROCESSES OR APPARATUS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>MICROSTRUCTURAL TECHNOLOGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2001</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD2DfUJ8Qzw8A_x91NwdAr2DwoI8QQyfV1DPPxdFEKDPf3cFQIcQ0Jcg_xcXRR8PN09QngYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSXy4v4GhpZmlmZGjkTERSgCQTidS</recordid><startdate>20011220</startdate><enddate>20011220</enddate><creator>FLEMING, PATRICK, R</creator><creator>BALLEN, TODD, A</creator><creator>LEATHERDALE, CATHERINE, A</creator><creator>DEVOE, ROBERT, J</creator><creator>STACEY, NICHOLAS, A</creator><creator>DEMASTER, ROBERT, D</creator><scope>EVB</scope></search><sort><creationdate>20011220</creationdate><title>MULTIPHOTON ABSORPTION METHOD USING PATTERNED LIGHT</title><author>FLEMING, PATRICK, R ; BALLEN, TODD, A ; LEATHERDALE, CATHERINE, A ; DEVOE, ROBERT, J ; STACEY, NICHOLAS, A ; DEMASTER, ROBERT, D</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO0196962A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2001</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHIC PROCESSES OR APPARATUS</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>MICROSTRUCTURAL TECHNOLOGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>FLEMING, PATRICK, R</creatorcontrib><creatorcontrib>BALLEN, TODD, A</creatorcontrib><creatorcontrib>LEATHERDALE, CATHERINE, A</creatorcontrib><creatorcontrib>DEVOE, ROBERT, J</creatorcontrib><creatorcontrib>STACEY, NICHOLAS, A</creatorcontrib><creatorcontrib>DEMASTER, ROBERT, D</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FLEMING, PATRICK, R</au><au>BALLEN, TODD, A</au><au>LEATHERDALE, CATHERINE, A</au><au>DEVOE, ROBERT, J</au><au>STACEY, NICHOLAS, A</au><au>DEMASTER, ROBERT, D</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MULTIPHOTON ABSORPTION METHOD USING PATTERNED LIGHT</title><date>2001-12-20</date><risdate>2001</risdate><abstract>Methods for producing a region of at least partially reacted material in a photoreactive composition and apparatus. The methods include: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons by the photoreactive composition; providing an exposure system capable of inducing image-wise multiphoton absorption; generating a non-random three-dimensional pattern of light by means of the exposure system; and exposing the photoreactive composition to the three-dimensional pattern of light generated by the exposure system to at least partially react a portion of the material in correspondence with the non-random three-dimensional pattern of light incident thereon.
L'invention concerne des procédés de production d'une région de matière ayant au moins partiellement réagi dans une composition et un dispositif de photoréaction. Les procédés comportent les étapes consistant à : prévoir une composition photoréactive ; prévoir une source de lumière suffisante pour provoquer l'absorption simultanée d'au moins deux photons par la composition photoréactive ; prévoir un système d'exposition capable d'induire une absorption multiphotonique par image ; produire un motif lumineux non aléatoire en trois dimensions au moyen du système d'exposition ; et exposer la composition photoréactive au motif lumineux en trois dimensions produit par le système d'exposition de manière à faire réagir au moins partiellement une partie de la matière selon le motif lumineux non aléatoire en trois dimensions incident.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; fre |
| recordid | cdi_epo_espacenet_WO0196962A2 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHIC PROCESSES OR APPARATUS HOLOGRAPHY MATERIALS THEREFOR MICROSTRUCTURAL TECHNOLOGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS TRANSPORTING |
| title | MULTIPHOTON ABSORPTION METHOD USING PATTERNED LIGHT |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-06T01%3A27%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=FLEMING,%20PATRICK,%20R&rft.date=2001-12-20&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO0196962A2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |