A METHOD FOR PRODUCING NiTiHf ALLOY FILMS BY SPUTTERING

Disclosed is a method for producing ternary shape-memory alloy films employing sputtering process techniques using krypton as a process gas. L'invention concerne un procédé de production de films d'alliage à mémoire de forme ternaire dans lequel on utilise des techniques de traitement par...

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Bibliographische Detailangaben

Hauptverfasser:	GOLD, TERRY, JACK, RASMUSSEN, GREGORY, KELLER, ZHANG, JINPING, CHANG, FENGLIAN
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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