A METHOD FOR PRODUCING NiTiHf ALLOY FILMS BY SPUTTERING

Disclosed is a method for producing ternary shape-memory alloy films employing sputtering process techniques using krypton as a process gas. L'invention concerne un procédé de production de films d'alliage à mémoire de forme ternaire dans lequel on utilise des techniques de traitement par...

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Hauptverfasser: GOLD, TERRY, JACK, RASMUSSEN, GREGORY, KELLER, ZHANG, JINPING, CHANG, FENGLIAN
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creator GOLD, TERRY, JACK
RASMUSSEN, GREGORY, KELLER
ZHANG, JINPING
CHANG, FENGLIAN
description Disclosed is a method for producing ternary shape-memory alloy films employing sputtering process techniques using krypton as a process gas. L'invention concerne un procédé de production de films d'alliage à mémoire de forme ternaire dans lequel on utilise des techniques de traitement par pulvérisation au moyen de krypton en tant que gaz de traitement.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO0121852A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO0121852A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO0121852A13</originalsourceid><addsrcrecordid>eNrjZDB3VPB1DfHwd1Fw8w9SCAjydwl19vRzV_DLDMn0SFNw9PHxj1Rw8_TxDVZwilQIDggNCXENAirgYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXx4f4GhkaGFqZGjobGRCgBAA4YKDA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A METHOD FOR PRODUCING NiTiHf ALLOY FILMS BY SPUTTERING</title><source>esp@cenet</source><creator>GOLD, TERRY, JACK ; RASMUSSEN, GREGORY, KELLER ; ZHANG, JINPING ; CHANG, FENGLIAN</creator><creatorcontrib>GOLD, TERRY, JACK ; RASMUSSEN, GREGORY, KELLER ; ZHANG, JINPING ; CHANG, FENGLIAN</creatorcontrib><description>Disclosed is a method for producing ternary shape-memory alloy films employing sputtering process techniques using krypton as a process gas. L'invention concerne un procédé de production de films d'alliage à mémoire de forme ternaire dans lequel on utilise des techniques de traitement par pulvérisation au moyen de krypton en tant que gaz de traitement.</description><edition>7</edition><language>eng ; fre</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2001</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20010329&amp;DB=EPODOC&amp;CC=WO&amp;NR=0121852A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20010329&amp;DB=EPODOC&amp;CC=WO&amp;NR=0121852A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GOLD, TERRY, JACK</creatorcontrib><creatorcontrib>RASMUSSEN, GREGORY, KELLER</creatorcontrib><creatorcontrib>ZHANG, JINPING</creatorcontrib><creatorcontrib>CHANG, FENGLIAN</creatorcontrib><title>A METHOD FOR PRODUCING NiTiHf ALLOY FILMS BY SPUTTERING</title><description>Disclosed is a method for producing ternary shape-memory alloy films employing sputtering process techniques using krypton as a process gas. L'invention concerne un procédé de production de films d'alliage à mémoire de forme ternaire dans lequel on utilise des techniques de traitement par pulvérisation au moyen de krypton en tant que gaz de traitement.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2001</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB3VPB1DfHwd1Fw8w9SCAjydwl19vRzV_DLDMn0SFNw9PHxj1Rw8_TxDVZwilQIDggNCXENAirgYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXx4f4GhkaGFqZGjobGRCgBAA4YKDA</recordid><startdate>20010329</startdate><enddate>20010329</enddate><creator>GOLD, TERRY, JACK</creator><creator>RASMUSSEN, GREGORY, KELLER</creator><creator>ZHANG, JINPING</creator><creator>CHANG, FENGLIAN</creator><scope>EVB</scope></search><sort><creationdate>20010329</creationdate><title>A METHOD FOR PRODUCING NiTiHf ALLOY FILMS BY SPUTTERING</title><author>GOLD, TERRY, JACK ; RASMUSSEN, GREGORY, KELLER ; ZHANG, JINPING ; CHANG, FENGLIAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO0121852A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2001</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>GOLD, TERRY, JACK</creatorcontrib><creatorcontrib>RASMUSSEN, GREGORY, KELLER</creatorcontrib><creatorcontrib>ZHANG, JINPING</creatorcontrib><creatorcontrib>CHANG, FENGLIAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GOLD, TERRY, JACK</au><au>RASMUSSEN, GREGORY, KELLER</au><au>ZHANG, JINPING</au><au>CHANG, FENGLIAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A METHOD FOR PRODUCING NiTiHf ALLOY FILMS BY SPUTTERING</title><date>2001-03-29</date><risdate>2001</risdate><abstract>Disclosed is a method for producing ternary shape-memory alloy films employing sputtering process techniques using krypton as a process gas. L'invention concerne un procédé de production de films d'alliage à mémoire de forme ternaire dans lequel on utilise des techniques de traitement par pulvérisation au moyen de krypton en tant que gaz de traitement.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title A METHOD FOR PRODUCING NiTiHf ALLOY FILMS BY SPUTTERING
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-21T17%3A35%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=GOLD,%20TERRY,%20JACK&rft.date=2001-03-29&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO0121852A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true