HF ETCHING AND OXIDE SCALE REMOVAL

Methods for etching or removing oxide scale from a substrate by applying a composition containing a polymer and an effective amount of hydrofluoric acid and maintaining the composition on the substrate until the substrate is etched or the oxide scale is removed. L'invention concerne des procédé...

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Bibliographische Detailangaben
Hauptverfasser: REDMON, CHARLES, L, MCKOWN, JEFFREY, W, PRATT, ROBERT, LULY, MATTHEW, H, SINGH, RAJIV, R
Format: Patent
Sprache:eng ; fre
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