HF ETCHING AND OXIDE SCALE REMOVAL

Methods for etching or removing oxide scale from a substrate by applying a composition containing a polymer and an effective amount of hydrofluoric acid and maintaining the composition on the substrate until the substrate is etched or the oxide scale is removed. L'invention concerne des procédé...

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Bibliographische Detailangaben
Hauptverfasser:	REDMON, CHARLES, L, MCKOWN, JEFFREY, W, PRATT, ROBERT, LULY, MATTHEW, H, SINGH, RAJIV, R
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	Methods for etching or removing oxide scale from a substrate by applying a composition containing a polymer and an effective amount of hydrofluoric acid and maintaining the composition on the substrate until the substrate is etched or the oxide scale is removed. L'invention concerne des procédés d'attaque ou d'élimination de la calamine d'un substrat, qui comportent les étapes consistant à appliquer une composition contenant un polymère et une quantité efficace d'acide fluorhydrique, et maintenir la composition sur le substrat jusqu'à ce que celui-ci soit attaqué ou que la calamine soit éliminée.