Method and/or system for chemical mechanical planarization (CMP)

One or more methods or systems for performing chemical mechanical planarization (CMP) are provided. The system includes at least one of an emitter, a detector, a spectroscopic signal generator, a comparator, a spectral library, a controller or a CMP device. A spectroscopic signal is generated and is...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Tsen, Yen-Di, Mou, Jong-I, Yen-Wei, Cheng
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING
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