Lithographic apparatus and device manufacturing method

A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the...

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Bibliographische Detailangaben
Hauptverfasser:	Teunissen, Franciscus Johannes Herman Maria, Baselmans, Johannes Jacobus Matheus, Van Santen, Helmar, Kolesnychenko, Aleksey Yurievich, Mertens, Jeroen Johannes Sophia Maria, Hoogendam, Christiaan Alexander, Mulkens, Johannes Catharinus Hubertus, Streefkerk, Bob, Jansen, Hans, Donders, Sjoerd Nicolaas Lambertus, Peeters, Felix Godfried Peter
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.