Method of semiconductor integrated circuit fabrication

A method of fabricating a semiconductor integrated circuit (IC) is disclosed. The method includes providing a substrate and depositing a conductive layer on the substrate. A patterned hard mask and a catalyst layer are formed on the conductive layer. The method further includes growing a plurality o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Peng, Chao-Hsien, Yeh, Ching-Fu, Wu, Hsien-Chang, Lee, Hsiang-Huan
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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