Stage apparatus, lithographic apparatus and method of positioning an object table

A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Van Der Pasch Engelbertus Antonius Fransiscus, Jeunink Andre Bernardus, Eussen Emiel Jozef Melanie, Van Leeuwen Robbert Edgar
Format: Patent
Sprache:eng
Schlagworte:
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