Dielectric window supporting structure for inductively coupled plasma processing apparatus

A dielectric window supporting structure of inductively coupled plasma (ICP) processing apparatus that includes a main container that houses a substrate to perform plasma processing, a substrate mounting unit on which the substrate is mounted, an exhaust system, a plurality of dielectric windows tha...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	Cho Saeng Hyun
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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