Transmission line RF applicator for plasma chamber
A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises two conductors, one of which has a plurality of apertures. In one aspect, apertures in different portions of the conductor have different sizes, spacing or orientatio...
Gespeichert in:
| Hauptverfasser: | , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Kudela Jozef Anwar Suhail Shinde Ranjit Indrajit Cho Seon-Mee Truong Douglas D White John M Sorensen Carl A Tanaka Tsutomu |
| description | A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises two conductors, one of which has a plurality of apertures. In one aspect, apertures in different portions of the conductor have different sizes, spacing or orientations. In another aspect, adjacent apertures at successive longitudinal positions are offset along the transverse dimension. In another aspect, the apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9818580B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9818580B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9818580B23</originalsourceid><addsrcrecordid>eNrjZDAKKUrMK87NLC7OzM9TyMnMS1UIclNILCjIyUxOLMkvUkgD4oKcxOLcRIXkjMTcpNQiHgbWtMSc4lReKM3NoODmGuLsoZtakB-fWlyQmJyal1oSHxpsaWFoYWph4GRkTIQSAHH4K8k</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Transmission line RF applicator for plasma chamber</title><source>esp@cenet</source><creator>Kudela Jozef ; Anwar Suhail ; Shinde Ranjit Indrajit ; Cho Seon-Mee ; Truong Douglas D ; White John M ; Sorensen Carl A ; Tanaka Tsutomu</creator><creatorcontrib>Kudela Jozef ; Anwar Suhail ; Shinde Ranjit Indrajit ; Cho Seon-Mee ; Truong Douglas D ; White John M ; Sorensen Carl A ; Tanaka Tsutomu</creatorcontrib><description>A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises two conductors, one of which has a plurality of apertures. In one aspect, apertures in different portions of the conductor have different sizes, spacing or orientations. In another aspect, adjacent apertures at successive longitudinal positions are offset along the transverse dimension. In another aspect, the apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor.</description><language>eng</language><subject>ANTENNAS, i.e. RADIO AERIALS ; BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE ; WAVEGUIDES</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171114&DB=EPODOC&CC=US&NR=9818580B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171114&DB=EPODOC&CC=US&NR=9818580B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Kudela Jozef</creatorcontrib><creatorcontrib>Anwar Suhail</creatorcontrib><creatorcontrib>Shinde Ranjit Indrajit</creatorcontrib><creatorcontrib>Cho Seon-Mee</creatorcontrib><creatorcontrib>Truong Douglas D</creatorcontrib><creatorcontrib>White John M</creatorcontrib><creatorcontrib>Sorensen Carl A</creatorcontrib><creatorcontrib>Tanaka Tsutomu</creatorcontrib><title>Transmission line RF applicator for plasma chamber</title><description>A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises two conductors, one of which has a plurality of apertures. In one aspect, apertures in different portions of the conductor have different sizes, spacing or orientations. In another aspect, adjacent apertures at successive longitudinal positions are offset along the transverse dimension. In another aspect, the apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor.</description><subject>ANTENNAS, i.e. RADIO AERIALS</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE</subject><subject>WAVEGUIDES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAKKUrMK87NLC7OzM9TyMnMS1UIclNILCjIyUxOLMkvUkgD4oKcxOLcRIXkjMTcpNQiHgbWtMSc4lReKM3NoODmGuLsoZtakB-fWlyQmJyal1oSHxpsaWFoYWph4GRkTIQSAHH4K8k</recordid><startdate>20171114</startdate><enddate>20171114</enddate><creator>Kudela Jozef</creator><creator>Anwar Suhail</creator><creator>Shinde Ranjit Indrajit</creator><creator>Cho Seon-Mee</creator><creator>Truong Douglas D</creator><creator>White John M</creator><creator>Sorensen Carl A</creator><creator>Tanaka Tsutomu</creator><scope>EVB</scope></search><sort><creationdate>20171114</creationdate><title>Transmission line RF applicator for plasma chamber</title><author>Kudela Jozef ; Anwar Suhail ; Shinde Ranjit Indrajit ; Cho Seon-Mee ; Truong Douglas D ; White John M ; Sorensen Carl A ; Tanaka Tsutomu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9818580B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>ANTENNAS, i.e. RADIO AERIALS</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE</topic><topic>WAVEGUIDES</topic><toplevel>online_resources</toplevel><creatorcontrib>Kudela Jozef</creatorcontrib><creatorcontrib>Anwar Suhail</creatorcontrib><creatorcontrib>Shinde Ranjit Indrajit</creatorcontrib><creatorcontrib>Cho Seon-Mee</creatorcontrib><creatorcontrib>Truong Douglas D</creatorcontrib><creatorcontrib>White John M</creatorcontrib><creatorcontrib>Sorensen Carl A</creatorcontrib><creatorcontrib>Tanaka Tsutomu</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Kudela Jozef</au><au>Anwar Suhail</au><au>Shinde Ranjit Indrajit</au><au>Cho Seon-Mee</au><au>Truong Douglas D</au><au>White John M</au><au>Sorensen Carl A</au><au>Tanaka Tsutomu</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Transmission line RF applicator for plasma chamber</title><date>2017-11-14</date><risdate>2017</risdate><abstract>A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises two conductors, one of which has a plurality of apertures. In one aspect, apertures in different portions of the conductor have different sizes, spacing or orientations. In another aspect, adjacent apertures at successive longitudinal positions are offset along the transverse dimension. In another aspect, the apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US9818580B2 |
| source | esp@cenet |
| subjects | ANTENNAS, i.e. RADIO AERIALS BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE WAVEGUIDES |
| title | Transmission line RF applicator for plasma chamber |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-31T22%3A34%3A01IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Kudela%20Jozef&rft.date=2017-11-14&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS9818580B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |