Catadioptric projection objective comprising deflection mirrors and projection exposure method

A projection exposure apparatus includes a catadioptric projection objective, an illumination system, a stage, and a control unit. The catadioptric projection objective includes multiple objective parts, and one or more active manipulators coupled to one or more optical elements of the projection ob...

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Bibliographische Detailangaben
Hauptverfasser:	Gruner Toralf, Schicketanz Thomas
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A projection exposure apparatus includes a catadioptric projection objective, an illumination system, a stage, and a control unit. The catadioptric projection objective includes multiple objective parts, and one or more active manipulators coupled to one or more optical elements of the projection objective. The control unit is programmed to cause the one or more active manipulators to act on one or more corresponding optical elements while the stage scans a wafer with respect to an image field to reduce errors in the image at the image field.