Selective deposition of metallic films

Metallic layers can be selectively deposited on one surface of a substrate relative to a second surface of the substrate. In some embodiments, the metallic layers are selectively deposited on a first metallic surface relative to a second surface comprising silicon. In some embodiments the reaction c...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Ishikawa Dai, Onuma Takahiro, Namba Kunitoshi, Chen Shang, Watarai Toshiharu
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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