Methods for forming semiconductor devices with stepped bond pads

A method for forming a semiconductor structure includes forming a bond pad over a last metal layer of the semiconductor structure wherein the bond pad includes a wire bond region; and recessing the wire bond region such that the wire bond region has a first thickness and a region of the bond pad out...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Tran Tu-Anh N, Junker Kurt H
Format: Patent
Sprache:eng
Schlagworte:
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