Heater control apparatus for gas sensor

In a heather control apparatus for a gas sensor, a CPU obtains upper and lower limit values by adding a predetermined value to and subtracting the predetermined value from an Rpvs average obtained in a last heater energization period (or to an Rpvs value obtained for the first time), and sets a wind...

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Bibliographische Detailangaben
Hauptverfasser:	Uemura Tomonori, Yazawa Katsunori
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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Beschreibung
Zusammenfassung:	In a heather control apparatus for a gas sensor, a CPU obtains upper and lower limit values by adding a predetermined value to and subtracting the predetermined value from an Rpvs average obtained in a last heater energization period (or to an Rpvs value obtained for the first time), and sets a window W1. The CPU obtains a plurality of Rpvs values [P2] to [P11], and obtains an Rpvs average A1 while excluding Rpvs values [P5], [P6], and [P9] which do not fall within the window W1 (not less than the lower limit value and not greater than the upper limit value). The CPU obtains the upper and lower limit values by adding the predetermined value to and subtracting the predetermined value from the Rpvs average A1, and sets a window W2 for the next heater energization period.