Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method

A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital m...

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Bibliographische Detailangaben
Hauptverfasser: Chang Jae-Hyuk, Park Jung-In, Yun Sang-Hyun, Lee Hi-Kuk, Lee Sang-Hyun, Kim Hyun-Seok, Lee Ki-Beom, Sim Jun-Ho, Heo Jung-Chul, Seo Kab-Jong
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.