Plasma dry reforming apparatus

The present invention discloses a plasma dry reforming apparatus for producing synthetic gas, main components of which are hydrogen and carbon monoxide, by reforming methane and carbon dioxide injected in plasma, the apparatus comprising: a plasma reformer 100, 200 which produces carbon dioxide plas...

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Bibliographische Detailangaben
Hauptverfasser:	Hong Yong Cheol, Cho Seong Yun, Chun Se Min
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention discloses a plasma dry reforming apparatus for producing synthetic gas, main components of which are hydrogen and carbon monoxide, by reforming methane and carbon dioxide injected in plasma, the apparatus comprising: a plasma reformer 100, 200 which produces carbon dioxide plasma by making carbon dioxide supplied therein into plasma, ignites plasma flame by supplying hydrocarbon to the produced dioxide plasma, and produces synthetic gas by supplying methane to the plasma flame.