Metallization having high power compatibility and high electrical conductivity

A metallization, for carrying current in an electrical component, includes a bottom layer overlying a substrate surface and includes titanium (Ti) or a titanium compound as main constituent. An upper layer overlies the bottom layer and includes copper (Cu) as main constituent. The bottom layer and t...

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Hauptverfasser: Zottl Helmut, Nuessl Rudolf, Binninger Charles, Ruile Werner, Knauer Ulrich, Jewula Tomasz
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creator Zottl Helmut
Nuessl Rudolf
Binninger Charles
Ruile Werner
Knauer Ulrich
Jewula Tomasz
description A metallization, for carrying current in an electrical component, includes a bottom layer overlying a substrate surface and includes titanium (Ti) or a titanium compound as main constituent. An upper layer overlies the bottom layer and includes copper (Cu) as main constituent. The bottom layer and the upper layer form a base layer. A top layer is in direct contact with the upper layer and includes aluminum (Al) as main constituent. The base layer further includes a middle layer, consisting of silver, that is arranged between the bottom layer and the upper layer.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9728705B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9728705B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9728705B23</originalsourceid><addsrcrecordid>eNrjZPDzTS1JzMnJrEosyczPU8hILMvMS1fIyEzPUCjIL08tUkjOzy0AyiVl5mSWVCok5qVAJFNzUpNLijKTE3OAKvJSSpNLMsuACngYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSXxosKW5kYW5gamTkTERSgAbUDdE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Metallization having high power compatibility and high electrical conductivity</title><source>esp@cenet</source><creator>Zottl Helmut ; Nuessl Rudolf ; Binninger Charles ; Ruile Werner ; Knauer Ulrich ; Jewula Tomasz</creator><creatorcontrib>Zottl Helmut ; Nuessl Rudolf ; Binninger Charles ; Ruile Werner ; Knauer Ulrich ; Jewula Tomasz</creatorcontrib><description>A metallization, for carrying current in an electrical component, includes a bottom layer overlying a substrate surface and includes titanium (Ti) or a titanium compound as main constituent. An upper layer overlies the bottom layer and includes copper (Cu) as main constituent. The bottom layer and the upper layer form a base layer. A top layer is in direct contact with the upper layer and includes aluminum (Al) as main constituent. The base layer further includes a middle layer, consisting of silver, that is arranged between the bottom layer and the upper layer.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; BASIC ELECTRONIC CIRCUITRY ; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS ; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ; PRINTED CIRCUITS ; RESONATORS ; SEMICONDUCTOR DEVICES</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170808&amp;DB=EPODOC&amp;CC=US&amp;NR=9728705B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170808&amp;DB=EPODOC&amp;CC=US&amp;NR=9728705B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Zottl Helmut</creatorcontrib><creatorcontrib>Nuessl Rudolf</creatorcontrib><creatorcontrib>Binninger Charles</creatorcontrib><creatorcontrib>Ruile Werner</creatorcontrib><creatorcontrib>Knauer Ulrich</creatorcontrib><creatorcontrib>Jewula Tomasz</creatorcontrib><title>Metallization having high power compatibility and high electrical conductivity</title><description>A metallization, for carrying current in an electrical component, includes a bottom layer overlying a substrate surface and includes titanium (Ti) or a titanium compound as main constituent. An upper layer overlies the bottom layer and includes copper (Cu) as main constituent. The bottom layer and the upper layer form a base layer. A top layer is in direct contact with the upper layer and includes aluminum (Al) as main constituent. The base layer further includes a middle layer, consisting of silver, that is arranged between the bottom layer and the upper layer.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BASIC ELECTRONIC CIRCUITRY</subject><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS</subject><subject>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</subject><subject>PRINTED CIRCUITS</subject><subject>RESONATORS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPDzTS1JzMnJrEosyczPU8hILMvMS1fIyEzPUCjIL08tUkjOzy0AyiVl5mSWVCok5qVAJFNzUpNLijKTE3OAKvJSSpNLMsuACngYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSXxosKW5kYW5gamTkTERSgAbUDdE</recordid><startdate>20170808</startdate><enddate>20170808</enddate><creator>Zottl Helmut</creator><creator>Nuessl Rudolf</creator><creator>Binninger Charles</creator><creator>Ruile Werner</creator><creator>Knauer Ulrich</creator><creator>Jewula Tomasz</creator><scope>EVB</scope></search><sort><creationdate>20170808</creationdate><title>Metallization having high power compatibility and high electrical conductivity</title><author>Zottl Helmut ; Nuessl Rudolf ; Binninger Charles ; Ruile Werner ; Knauer Ulrich ; Jewula Tomasz</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9728705B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BASIC ELECTRONIC CIRCUITRY</topic><topic>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS</topic><topic>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</topic><topic>PRINTED CIRCUITS</topic><topic>RESONATORS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Zottl Helmut</creatorcontrib><creatorcontrib>Nuessl Rudolf</creatorcontrib><creatorcontrib>Binninger Charles</creatorcontrib><creatorcontrib>Ruile Werner</creatorcontrib><creatorcontrib>Knauer Ulrich</creatorcontrib><creatorcontrib>Jewula Tomasz</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Zottl Helmut</au><au>Nuessl Rudolf</au><au>Binninger Charles</au><au>Ruile Werner</au><au>Knauer Ulrich</au><au>Jewula Tomasz</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Metallization having high power compatibility and high electrical conductivity</title><date>2017-08-08</date><risdate>2017</risdate><abstract>A metallization, for carrying current in an electrical component, includes a bottom layer overlying a substrate surface and includes titanium (Ti) or a titanium compound as main constituent. An upper layer overlies the bottom layer and includes copper (Cu) as main constituent. The bottom layer and the upper layer form a base layer. A top layer is in direct contact with the upper layer and includes aluminum (Al) as main constituent. The base layer further includes a middle layer, consisting of silver, that is arranged between the bottom layer and the upper layer.</abstract><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
BASIC ELECTRONIC CIRCUITRY
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
PRINTED CIRCUITS
RESONATORS
SEMICONDUCTOR DEVICES
title Metallization having high power compatibility and high electrical conductivity
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T00%3A18%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Zottl%20Helmut&rft.date=2017-08-08&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS9728705B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true