Active matrix substrate manufacturing method, display apparatus manufacturing method, and display apparatus

According to an embodiment of the present invention, an active matrix substrate manufacturing method includes: a step (a) of forming a thin film transistor on a substrate; a step (b) of forming an interlayer insulating layer covering the thin film transistor; a step (c) of forming a first electrode...

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1. Verfasser: Tomiyasu Kazuhide
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creator Tomiyasu Kazuhide
description According to an embodiment of the present invention, an active matrix substrate manufacturing method includes: a step (a) of forming a thin film transistor on a substrate; a step (b) of forming an interlayer insulating layer covering the thin film transistor; a step (c) of forming a first electrode after the step (b); a step (d) of forming, after the step (c), a photospacer by applying a photosensitive resin material to the substrate and patterning the photosensitive resin material; and a step (e) of performing, after the step (d), plasma processing using a gas that contains a fluorine-based gas but does not contain oxygen gas.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9726940B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9726940B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9726940B23</originalsourceid><addsrcrecordid>eNrjZMh2TC7JLEtVyE0sKcqsUCguTSouKUosAQnklaYlJpeUFmXmpSvkppZk5KfoKKRkFhfkJFYqJBYUJAKVlRbjUJeYl4KploeBNS0xpziVF0pzMyi4uYY4e-imFuTHpxYXJCan5qWWxIcGW5obmVmaGDgZGROhBAD_YEJf</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Active matrix substrate manufacturing method, display apparatus manufacturing method, and display apparatus</title><source>esp@cenet</source><creator>Tomiyasu Kazuhide</creator><creatorcontrib>Tomiyasu Kazuhide</creatorcontrib><description>According to an embodiment of the present invention, an active matrix substrate manufacturing method includes: a step (a) of forming a thin film transistor on a substrate; a step (b) of forming an interlayer insulating layer covering the thin film transistor; a step (c) of forming a first electrode after the step (b); a step (d) of forming, after the step (c), a photospacer by applying a photosensitive resin material to the substrate and patterning the photosensitive resin material; and a step (e) of performing, after the step (d), plasma processing using a gas that contains a fluorine-based gas but does not contain oxygen gas.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FREQUENCY-CHANGING ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; PHYSICS ; SEMICONDUCTOR DEVICES ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170808&amp;DB=EPODOC&amp;CC=US&amp;NR=9726940B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170808&amp;DB=EPODOC&amp;CC=US&amp;NR=9726940B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Tomiyasu Kazuhide</creatorcontrib><title>Active matrix substrate manufacturing method, display apparatus manufacturing method, and display apparatus</title><description>According to an embodiment of the present invention, an active matrix substrate manufacturing method includes: a step (a) of forming a thin film transistor on a substrate; a step (b) of forming an interlayer insulating layer covering the thin film transistor; a step (c) of forming a first electrode after the step (b); a step (d) of forming, after the step (c), a photospacer by applying a photosensitive resin material to the substrate and patterning the photosensitive resin material; and a step (e) of performing, after the step (d), plasma processing using a gas that contains a fluorine-based gas but does not contain oxygen gas.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FREQUENCY-CHANGING</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZMh2TC7JLEtVyE0sKcqsUCguTSouKUosAQnklaYlJpeUFmXmpSvkppZk5KfoKKRkFhfkJFYqJBYUJAKVlRbjUJeYl4KploeBNS0xpziVF0pzMyi4uYY4e-imFuTHpxYXJCan5qWWxIcGW5obmVmaGDgZGROhBAD_YEJf</recordid><startdate>20170808</startdate><enddate>20170808</enddate><creator>Tomiyasu Kazuhide</creator><scope>EVB</scope></search><sort><creationdate>20170808</creationdate><title>Active matrix substrate manufacturing method, display apparatus manufacturing method, and display apparatus</title><author>Tomiyasu Kazuhide</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9726940B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FREQUENCY-CHANGING</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><toplevel>online_resources</toplevel><creatorcontrib>Tomiyasu Kazuhide</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Tomiyasu Kazuhide</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Active matrix substrate manufacturing method, display apparatus manufacturing method, and display apparatus</title><date>2017-08-08</date><risdate>2017</risdate><abstract>According to an embodiment of the present invention, an active matrix substrate manufacturing method includes: a step (a) of forming a thin film transistor on a substrate; a step (b) of forming an interlayer insulating layer covering the thin film transistor; a step (c) of forming a first electrode after the step (b); a step (d) of forming, after the step (c), a photospacer by applying a photosensitive resin material to the substrate and patterning the photosensitive resin material; and a step (e) of performing, after the step (d), plasma processing using a gas that contains a fluorine-based gas but does not contain oxygen gas.</abstract><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
title Active matrix substrate manufacturing method, display apparatus manufacturing method, and display apparatus
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T12%3A28%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Tomiyasu%20Kazuhide&rft.date=2017-08-08&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS9726940B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true