Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
A lithography tool is calibrated using a calibration substrate having a set of first marks distributed across its surface in a known pattern. The tool is operated to apply a pattern comprising a plurality of second marks at various positions on the substrate, each second mark overlying one of the fi...
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creator | Luehrmann Paul Frank Schmitt-Weaver Emil Peter Henke Wolfgang Kea Marc Jurian |
description | A lithography tool is calibrated using a calibration substrate having a set of first marks distributed across its surface in a known pattern. The tool is operated to apply a pattern comprising a plurality of second marks at various positions on the substrate, each second mark overlying one of the first marks and being subject to an overlay error dependent on an apparatus-specific deviation. The second marks are applied by multiple exposures while the substrate remains loaded in the tool. An operating parameter of the apparatus is varied between the exposures. An overlay error is measured and used to calculate parameter-specific, apparatus-specific calibration data based on knowledge of the parameter variation used for each exposure. |
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The tool is operated to apply a pattern comprising a plurality of second marks at various positions on the substrate, each second mark overlying one of the first marks and being subject to an overlay error dependent on an apparatus-specific deviation. The second marks are applied by multiple exposures while the substrate remains loaded in the tool. An operating parameter of the apparatus is varied between the exposures. 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An overlay error is measured and used to calculate parameter-specific, apparatus-specific calibration data based on knowledge of the parameter variation used for each exposure.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjT0OwjAMhbswIOAOPgAMBSFgBYFYmIC5Mo7bRmp-lDjcgxuTFtgZrCe99-nzuHhdWFqnwNVA2OlHQNG2AYRO574J6FtNgN5jXlKcg-KnJgaDNtVIkkKPm48Ebb4YHWkUVqBQEHxwxDEO0p9lAMkZn4RDT-Q_pk-VSKbFqMYu8uybkwJOx9vhvGDvKo4eiS1Ldb_uNuW63Jb75eoP5A3G31B3</recordid><startdate>20170725</startdate><enddate>20170725</enddate><creator>Luehrmann Paul Frank</creator><creator>Schmitt-Weaver Emil Peter</creator><creator>Henke Wolfgang</creator><creator>Kea Marc Jurian</creator><scope>EVB</scope></search><sort><creationdate>20170725</creationdate><title>Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product</title><author>Luehrmann Paul Frank ; Schmitt-Weaver Emil Peter ; Henke Wolfgang ; Kea Marc Jurian</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9715181B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>Luehrmann Paul Frank</creatorcontrib><creatorcontrib>Schmitt-Weaver Emil Peter</creatorcontrib><creatorcontrib>Henke Wolfgang</creatorcontrib><creatorcontrib>Kea Marc Jurian</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Luehrmann Paul Frank</au><au>Schmitt-Weaver Emil Peter</au><au>Henke Wolfgang</au><au>Kea Marc Jurian</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product</title><date>2017-07-25</date><risdate>2017</risdate><abstract>A lithography tool is calibrated using a calibration substrate having a set of first marks distributed across its surface in a known pattern. The tool is operated to apply a pattern comprising a plurality of second marks at various positions on the substrate, each second mark overlying one of the first marks and being subject to an overlay error dependent on an apparatus-specific deviation. The second marks are applied by multiple exposures while the substrate remains loaded in the tool. An operating parameter of the apparatus is varied between the exposures. An overlay error is measured and used to calculate parameter-specific, apparatus-specific calibration data based on knowledge of the parameter variation used for each exposure.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product |
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