Determining a configuration for an optical element positioned in a collection aperture during wafer inspection

Determining a configuration for an optical element positioned in a collection aperture during wafer inspection

Methods and systems for determining a configuration for an optical element positioned in a collection aperture during wafer inspection are provided. One system includes a detector configured to detect light from a wafer that passes through an optical element, which includes a set of collection apert...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Danen Robert, Kapp Dan, Wei Junwei, Haurylau Mikhail, Kolchin Pavel, Chen Grace
Format: Patent
Sprache:eng
Schlagworte:
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Danen Robert
Kapp Dan
Wei Junwei
Haurylau Mikhail
Kolchin Pavel
Chen Grace
description Methods and systems for determining a configuration for an optical element positioned in a collection aperture during wafer inspection are provided. One system includes a detector configured to detect light from a wafer that passes through an optical element, which includes a set of collection apertures, when the optical element has different configurations thereby generating different images for the different configurations. The system also includes a computer subsystem configured for constructing additional image(s) from two or more of the different images, and the two or more different images used to generate any one of the additional image(s) do not include only different images generated for single collection apertures in the set. The computer subsystem is further configured for selecting one of the different or additional configurations for the optical element based on the different images and the additional image(s).
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9709510B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9709510B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9709510B23</originalsourceid><addsrcrecordid>eNqNjEsKwkAQBbNxIeod-gJCVESy9Yd7dR2ayZvQMOkZ5oPX10QP4OotqurNKz0jIw6ioj0xGa9W-hI5i1eyPhIr-ZDFsCM4DNBMwScZOToSnSLnYKaCA2IuEdSVOD6-2CJ-rBS-wrKaWXYJq98uKrpeHqfbGsG3SIENFLl93ptD3ew39XG7-0N5A44AQwQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Determining a configuration for an optical element positioned in a collection aperture during wafer inspection</title><source>esp@cenet</source><creator>Danen Robert ; Kapp Dan ; Wei Junwei ; Haurylau Mikhail ; Kolchin Pavel ; Chen Grace</creator><creatorcontrib>Danen Robert ; Kapp Dan ; Wei Junwei ; Haurylau Mikhail ; Kolchin Pavel ; Chen Grace</creatorcontrib><description>Methods and systems for determining a configuration for an optical element positioned in a collection aperture during wafer inspection are provided. One system includes a detector configured to detect light from a wafer that passes through an optical element, which includes a set of collection apertures, when the optical element has different configurations thereby generating different images for the different configurations. The system also includes a computer subsystem configured for constructing additional image(s) from two or more of the different images, and the two or more different images used to generate any one of the additional image(s) do not include only different images generated for single collection apertures in the set. The computer subsystem is further configured for selecting one of the different or additional configurations for the optical element based on the different images and the additional image(s).</description><language>eng</language><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; PHYSICS ; TESTING</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170718&amp;DB=EPODOC&amp;CC=US&amp;NR=9709510B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170718&amp;DB=EPODOC&amp;CC=US&amp;NR=9709510B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Danen Robert</creatorcontrib><creatorcontrib>Kapp Dan</creatorcontrib><creatorcontrib>Wei Junwei</creatorcontrib><creatorcontrib>Haurylau Mikhail</creatorcontrib><creatorcontrib>Kolchin Pavel</creatorcontrib><creatorcontrib>Chen Grace</creatorcontrib><title>Determining a configuration for an optical element positioned in a collection aperture during wafer inspection</title><description>Methods and systems for determining a configuration for an optical element positioned in a collection aperture during wafer inspection are provided. One system includes a detector configured to detect light from a wafer that passes through an optical element, which includes a set of collection apertures, when the optical element has different configurations thereby generating different images for the different configurations. The system also includes a computer subsystem configured for constructing additional image(s) from two or more of the different images, and the two or more different images used to generate any one of the additional image(s) do not include only different images generated for single collection apertures in the set. The computer subsystem is further configured for selecting one of the different or additional configurations for the optical element based on the different images and the additional image(s).</description><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjEsKwkAQBbNxIeod-gJCVESy9Yd7dR2ayZvQMOkZ5oPX10QP4OotqurNKz0jIw6ioj0xGa9W-hI5i1eyPhIr-ZDFsCM4DNBMwScZOToSnSLnYKaCA2IuEdSVOD6-2CJ-rBS-wrKaWXYJq98uKrpeHqfbGsG3SIENFLl93ptD3ew39XG7-0N5A44AQwQ</recordid><startdate>20170718</startdate><enddate>20170718</enddate><creator>Danen Robert</creator><creator>Kapp Dan</creator><creator>Wei Junwei</creator><creator>Haurylau Mikhail</creator><creator>Kolchin Pavel</creator><creator>Chen Grace</creator><scope>EVB</scope></search><sort><creationdate>20170718</creationdate><title>Determining a configuration for an optical element positioned in a collection aperture during wafer inspection</title><author>Danen Robert ; Kapp Dan ; Wei Junwei ; Haurylau Mikhail ; Kolchin Pavel ; Chen Grace</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9709510B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Danen Robert</creatorcontrib><creatorcontrib>Kapp Dan</creatorcontrib><creatorcontrib>Wei Junwei</creatorcontrib><creatorcontrib>Haurylau Mikhail</creatorcontrib><creatorcontrib>Kolchin Pavel</creatorcontrib><creatorcontrib>Chen Grace</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Danen Robert</au><au>Kapp Dan</au><au>Wei Junwei</au><au>Haurylau Mikhail</au><au>Kolchin Pavel</au><au>Chen Grace</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Determining a configuration for an optical element positioned in a collection aperture during wafer inspection</title><date>2017-07-18</date><risdate>2017</risdate><abstract>Methods and systems for determining a configuration for an optical element positioned in a collection aperture during wafer inspection are provided. One system includes a detector configured to detect light from a wafer that passes through an optical element, which includes a set of collection apertures, when the optical element has different configurations thereby generating different images for the different configurations. The system also includes a computer subsystem configured for constructing additional image(s) from two or more of the different images, and the two or more different images used to generate any one of the additional image(s) do not include only different images generated for single collection apertures in the set. The computer subsystem is further configured for selecting one of the different or additional configurations for the optical element based on the different images and the additional image(s).</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US9709510B2
source esp@cenet
subjects INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
title Determining a configuration for an optical element positioned in a collection aperture during wafer inspection
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T19%3A47%3A36IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Danen%20Robert&rft.date=2017-07-18&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS9709510B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true