Semiconductor device structures

A method of forming a semiconductor structure comprises forming pools of acidic or basic material in a substrate structure. A resist is formed over the pools of acidic or basic material and the substrate structure. The acidic or basic material is diffused from the pools into portions of the resist p...

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Bibliographische Detailangaben
Hauptverfasser: Eom Ho Seop, deVilliers Anton J, Chen Xue, Jain Kaveri, Gou Lijing, Olson Adam L, Brown William R
Format: Patent
Sprache:eng
Schlagworte:
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