Radiation source and lithographic apparatus
A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a prede...
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| creator | Eurlings Markus Franciscus Antonius Noordman Oscar Franciscus Jozephus |
| description | A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength. |
| format | Patent |
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The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. 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The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAOSkzJTCzJzM9TKM4vLUpOVUjMS1HIySzJyE8vSizIyExWSCwoSCxKLCkt5mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8aHBlmYmpqYGBk5GxkQoAQA6PCmM</recordid><startdate>20170509</startdate><enddate>20170509</enddate><creator>Eurlings Markus Franciscus Antonius</creator><creator>Noordman Oscar Franciscus Jozephus</creator><scope>EVB</scope></search><sort><creationdate>20170509</creationdate><title>Radiation source and lithographic apparatus</title><author>Eurlings Markus Franciscus Antonius ; Noordman Oscar Franciscus Jozephus</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9645500B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>Eurlings Markus Franciscus Antonius</creatorcontrib><creatorcontrib>Noordman Oscar Franciscus Jozephus</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Eurlings Markus Franciscus Antonius</au><au>Noordman Oscar Franciscus Jozephus</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Radiation source and lithographic apparatus</title><date>2017-05-09</date><risdate>2017</risdate><abstract>A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE |
| title | Radiation source and lithographic apparatus |
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