System and method for controlling wafer and thin film surface temperature

A vapor deposition system and its wafer and thin-film temperature control method are disclosed. A susceptor carries a plurality of wafer holders with each bearing a wafer. The susceptor makes revolution around a center axle and each wafer holder rotates around its own axis. A carrier gas approaches...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Chung Bu-Chin, Wu Chung-Yuan
Format: Patent
Sprache:eng
Schlagworte:
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