Integrated circuits including modified liners and methods for fabricating the same

Integrated circuits and methods for fabricating integrated circuits are provided. In one example, a method for fabricating an integrated circuit includes contacting a liner that is disposed adjacent to a porous interlayer dielectric (ILD) layer of dielectric material with a selectively reactive gas...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Ryan Errol Todd, Zhang Xunyuan
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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