Peeling system

Disclosed is a peeling system which includes a peeling device, a plurality of first cleaning devices, an inversion device, a second cleaning device, and first to third conveyance devices. The peeling device is configured to separate a superimposed substrate into a first substrate and a second substr...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Fukutomi Akira, Iwashita Yasuharu, Umitsuki Masaaki, Tamura Takeshi
Format: Patent
Sprache:eng
Schlagworte:
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