Heat stabilizer for halogen-containing polymers
A stabilizer composition having low volatility and high efficiency comprising: (i.) 25.000% to 99.997% by weight of at least one dimethyltin compound of formula (CH3)2Sn(S(CH2)mCOOR1)2 wherein R1 is a linear, branched or cyclic C10-C20 alkyl group and m is 1 or 2, optionally containing unsaturations...
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| creator | Denoux Michael Mineo Garrett Frenkel Peter Di Maio Joseph Anthony |
| description | A stabilizer composition having low volatility and high efficiency comprising: (i.) 25.000% to 99.997% by weight of at least one dimethyltin compound of formula (CH3)2Sn(S(CH2)mCOOR1)2 wherein R1 is a linear, branched or cyclic C10-C20 alkyl group and m is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; (ii.) 0.001% to 50.000% by weight of at least one mono-methyltin compound of formula CH3Sn(S(CH2)nCOOR2)3 wherein R2 is a linear, branched or cyclic C10-C20 alkyl group and n is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; (iii.) 0.001% to 10.000% by weight of at least one tri-methyltin compound of formula (CH3)3Sn(S(CH2)pCOOR3) wherein R3 is a linear, branched or cyclic C10-C20 alkyl group and p is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; and (iv.) 0.001% to 15.000% by weight of at least one thioester of formula HS(CH2)qCOOR4 wherein R4 is a linear, branched or cyclic C10-C20 alkyl group and q is 1 or 2, optionally containing unsaturations in the form of double or triple bonds. |
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(ii.) 0.001% to 50.000% by weight of at least one mono-methyltin compound of formula CH3Sn(S(CH2)nCOOR2)3 wherein R2 is a linear, branched or cyclic C10-C20 alkyl group and n is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; (iii.) 0.001% to 10.000% by weight of at least one tri-methyltin compound of formula (CH3)3Sn(S(CH2)pCOOR3) wherein R3 is a linear, branched or cyclic C10-C20 alkyl group and p is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; and (iv.) 0.001% to 15.000% by weight of at least one thioester of formula HS(CH2)qCOOR4 wherein R4 is a linear, branched or cyclic C10-C20 alkyl group and q is 1 or 2, optionally containing unsaturations in the form of double or triple bonds.</description><language>eng</language><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ; ADHESIVES ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; DYES ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC CHEMISTRY ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170307&DB=EPODOC&CC=US&NR=9587088B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76292</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170307&DB=EPODOC&CC=US&NR=9587088B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Denoux Michael</creatorcontrib><creatorcontrib>Mineo Garrett</creatorcontrib><creatorcontrib>Frenkel Peter</creatorcontrib><creatorcontrib>Di Maio Joseph Anthony</creatorcontrib><title>Heat stabilizer for halogen-containing polymers</title><description>A stabilizer composition having low volatility and high efficiency comprising: (i.) 25.000% to 99.997% by weight of at least one dimethyltin compound of formula (CH3)2Sn(S(CH2)mCOOR1)2 wherein R1 is a linear, branched or cyclic C10-C20 alkyl group and m is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; (ii.) 0.001% to 50.000% by weight of at least one mono-methyltin compound of formula CH3Sn(S(CH2)nCOOR2)3 wherein R2 is a linear, branched or cyclic C10-C20 alkyl group and n is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; (iii.) 0.001% to 10.000% by weight of at least one tri-methyltin compound of formula (CH3)3Sn(S(CH2)pCOOR3) wherein R3 is a linear, branched or cyclic C10-C20 alkyl group and p is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; and (iv.) 0.001% to 15.000% by weight of at least one thioester of formula HS(CH2)qCOOR4 wherein R4 is a linear, branched or cyclic C10-C20 alkyl group and q is 1 or 2, optionally containing unsaturations in the form of double or triple bonds.</description><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</subject><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>DYES</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND3SE0sUSguSUzKzMmsSi1SSMsvUshIzMlPT83TTc7PK0nMzMvMS1coyM-pzE0tKuZhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGhwZamFuYGFhZORsZEKAEABAIrNA</recordid><startdate>20170307</startdate><enddate>20170307</enddate><creator>Denoux Michael</creator><creator>Mineo Garrett</creator><creator>Frenkel Peter</creator><creator>Di Maio Joseph Anthony</creator><scope>EVB</scope></search><sort><creationdate>20170307</creationdate><title>Heat stabilizer for halogen-containing polymers</title><author>Denoux Michael ; 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(ii.) 0.001% to 50.000% by weight of at least one mono-methyltin compound of formula CH3Sn(S(CH2)nCOOR2)3 wherein R2 is a linear, branched or cyclic C10-C20 alkyl group and n is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; (iii.) 0.001% to 10.000% by weight of at least one tri-methyltin compound of formula (CH3)3Sn(S(CH2)pCOOR3) wherein R3 is a linear, branched or cyclic C10-C20 alkyl group and p is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; and (iv.) 0.001% to 15.000% by weight of at least one thioester of formula HS(CH2)qCOOR4 wherein R4 is a linear, branched or cyclic C10-C20 alkyl group and q is 1 or 2, optionally containing unsaturations in the form of double or triple bonds.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ADHESIVES CHEMISTRY COMPOSITIONS BASED THEREON DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS PAINTS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS |
| title | Heat stabilizer for halogen-containing polymers |
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