Germanium oxide pre-clean module and process

In some embodiments, a method for integrated circuit fabrication includes removing oxide material from a surface of a substrate, where the surface includes silicon and germanium. Removing the oxide material includes depositing a halogen-containing pre-clean material on a silicon oxide-containing sur...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Tolle John, Goodman Matthew G
Format: Patent
Sprache:eng
Schlagworte:
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