Substrate positioning system, lithographic apparatus and device manufacturing method
A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the ope...
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| creator | Van Der Pasch Engelbertus Antonius Fransiscus Cosijns Suzanne Johanna Antonetta Geertruda Auer Frank Jeunink Andre Bernardus Jansen Albert Johannes Maria Smit Sebastiaan Vermunt Joris Wilhelmus Henricus Adriaens Johannes Mathias Theodorus Antonius Broomans Peterjan Koenen Willem Herman Gertruda Anna |
| description | A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table. |
| format | Patent |
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CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161018&DB=EPODOC&CC=US&NR=9470988B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161018&DB=EPODOC&CC=US&NR=9470988B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Van Der Pasch Engelbertus Antonius Fransiscus</creatorcontrib><creatorcontrib>Cosijns Suzanne Johanna Antonetta Geertruda</creatorcontrib><creatorcontrib>Auer Frank</creatorcontrib><creatorcontrib>Jeunink Andre Bernardus</creatorcontrib><creatorcontrib>Jansen Albert Johannes Maria</creatorcontrib><creatorcontrib>Smit Sebastiaan</creatorcontrib><creatorcontrib>Vermunt Joris Wilhelmus Henricus</creatorcontrib><creatorcontrib>Adriaens Johannes Mathias Theodorus Antonius</creatorcontrib><creatorcontrib>Broomans Peterjan</creatorcontrib><creatorcontrib>Koenen Willem Herman Gertruda Anna</creatorcontrib><title>Substrate positioning system, lithographic apparatus and device manufacturing method</title><description>A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Substrate positioning system, lithographic apparatus and device manufacturing method |
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