P-type metal oxide semiconductor material and transistor

A p-type metal oxide semiconductor material is provided, which is composed of AlxGe(1-x)Oy, wherein 0

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Chao Wen-Hsuan, Chang Mu-Tung, Cheng Hsin-Ming, Chiou Shan-Haw, Chou Tzu-Chi, Huang Tien-Heng, Cai Ren-Fong
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Chao Wen-Hsuan
Chang Mu-Tung
Cheng Hsin-Ming
Chiou Shan-Haw
Chou Tzu-Chi
Huang Tien-Heng
Cai Ren-Fong
description A p-type metal oxide semiconductor material is provided, which is composed of AlxGe(1-x)Oy, wherein 0
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9401433B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9401433B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9401433B13</originalsourceid><addsrcrecordid>eNrjZLAI0C2pLEhVyE0tScxRyK_ITElVKE7NzUzOz0spTS7JL1LITSxJLcoESibmpSiUFCXmFWcWA8V5GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakl8aLCliYGhibGxk6ExEUoA0a8uZA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>P-type metal oxide semiconductor material and transistor</title><source>esp@cenet</source><creator>Chao Wen-Hsuan ; Chang Mu-Tung ; Cheng Hsin-Ming ; Chiou Shan-Haw ; Chou Tzu-Chi ; Huang Tien-Heng ; Cai Ren-Fong</creator><creatorcontrib>Chao Wen-Hsuan ; Chang Mu-Tung ; Cheng Hsin-Ming ; Chiou Shan-Haw ; Chou Tzu-Chi ; Huang Tien-Heng ; Cai Ren-Fong</creatorcontrib><description>A p-type metal oxide semiconductor material is provided, which is composed of AlxGe(1-x)Oy, wherein 0&lt;x≦0.6, and 1.0≦y≦2.0. The p-type metal oxide semiconductor material can be applied in a transistor. The transistor may include a gate electrode, a channel layer separated from the gate electrode by a gate insulation layer, and a source electrode and a drain electrode contacting two sides of the channel layer, wherein the channel layer is the p-type metal oxide semiconductor material.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20160726&amp;DB=EPODOC&amp;CC=US&amp;NR=9401433B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20160726&amp;DB=EPODOC&amp;CC=US&amp;NR=9401433B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Chao Wen-Hsuan</creatorcontrib><creatorcontrib>Chang Mu-Tung</creatorcontrib><creatorcontrib>Cheng Hsin-Ming</creatorcontrib><creatorcontrib>Chiou Shan-Haw</creatorcontrib><creatorcontrib>Chou Tzu-Chi</creatorcontrib><creatorcontrib>Huang Tien-Heng</creatorcontrib><creatorcontrib>Cai Ren-Fong</creatorcontrib><title>P-type metal oxide semiconductor material and transistor</title><description>A p-type metal oxide semiconductor material is provided, which is composed of AlxGe(1-x)Oy, wherein 0&lt;x≦0.6, and 1.0≦y≦2.0. The p-type metal oxide semiconductor material can be applied in a transistor. The transistor may include a gate electrode, a channel layer separated from the gate electrode by a gate insulation layer, and a source electrode and a drain electrode contacting two sides of the channel layer, wherein the channel layer is the p-type metal oxide semiconductor material.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAI0C2pLEhVyE0tScxRyK_ITElVKE7NzUzOz0spTS7JL1LITSxJLcoESibmpSiUFCXmFWcWA8V5GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakl8aLCliYGhibGxk6ExEUoA0a8uZA</recordid><startdate>20160726</startdate><enddate>20160726</enddate><creator>Chao Wen-Hsuan</creator><creator>Chang Mu-Tung</creator><creator>Cheng Hsin-Ming</creator><creator>Chiou Shan-Haw</creator><creator>Chou Tzu-Chi</creator><creator>Huang Tien-Heng</creator><creator>Cai Ren-Fong</creator><scope>EVB</scope></search><sort><creationdate>20160726</creationdate><title>P-type metal oxide semiconductor material and transistor</title><author>Chao Wen-Hsuan ; Chang Mu-Tung ; Cheng Hsin-Ming ; Chiou Shan-Haw ; Chou Tzu-Chi ; Huang Tien-Heng ; Cai Ren-Fong</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9401433B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Chao Wen-Hsuan</creatorcontrib><creatorcontrib>Chang Mu-Tung</creatorcontrib><creatorcontrib>Cheng Hsin-Ming</creatorcontrib><creatorcontrib>Chiou Shan-Haw</creatorcontrib><creatorcontrib>Chou Tzu-Chi</creatorcontrib><creatorcontrib>Huang Tien-Heng</creatorcontrib><creatorcontrib>Cai Ren-Fong</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Chao Wen-Hsuan</au><au>Chang Mu-Tung</au><au>Cheng Hsin-Ming</au><au>Chiou Shan-Haw</au><au>Chou Tzu-Chi</au><au>Huang Tien-Heng</au><au>Cai Ren-Fong</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>P-type metal oxide semiconductor material and transistor</title><date>2016-07-26</date><risdate>2016</risdate><abstract>A p-type metal oxide semiconductor material is provided, which is composed of AlxGe(1-x)Oy, wherein 0&lt;x≦0.6, and 1.0≦y≦2.0. The p-type metal oxide semiconductor material can be applied in a transistor. The transistor may include a gate electrode, a channel layer separated from the gate electrode by a gate insulation layer, and a source electrode and a drain electrode contacting two sides of the channel layer, wherein the channel layer is the p-type metal oxide semiconductor material.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US9401433B1
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title P-type metal oxide semiconductor material and transistor
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-23T00%3A10%3A35IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Chao%20Wen-Hsuan&rft.date=2016-07-26&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS9401433B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true