Pellicles and devices comprising a photomask and the pellicle
A pellicle is provided for use with a lithographic photomask during manufacture of semiconductor devices, printed circuit boards, liquid crystal displays, etc. The pellicle has a pellicle frame comprising four pellicle walls that define a trapezoidal area sized and shaped to correspond to a pattern...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A pellicle is provided for use with a lithographic photomask during manufacture of semiconductor devices, printed circuit boards, liquid crystal displays, etc. The pellicle has a pellicle frame comprising four pellicle walls that define a trapezoidal area sized and shaped to correspond to a pattern area of a lithographic photomask; and a pellicle film extending across the trapezoidal area and affixed to a film-side edge of the pellicle frame; wherein any one of the four pellicle walls has a vent hole therethrough, the vent hole being located proximate a corner of the frame and if matter passes through the vent hole, the foreign matter will not obstruct the pattern area during use of the lithographic photomask. |
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