Substrate processing apparatus

A substrate processing apparatus 1 includes a substrate processing unit 40 configured to process a substrate W by supplying a mixed liquid M of a first liquid C and a second liquid D to the substrate W, a first flow rate regulator 10 disposed in a first supply pipe 31 configured to allow the first l...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MARUYAMA TORU, KOMATSU MITSUNORI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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