Vertical semiconductor device including element active portion and voltage withstanding structure portion, and method of manufacturing the vertical semiconductor device
Aspects of the invention are directed to a vertical semiconductor device including an element active portion and a voltage withstanding structure portion that has a first main electrode and a gate pad electrode on a first main surface of the element active portion, includes first parallel pn layers...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!