Thin film transistor, electronic device having the same, and method for manufacturing the same

An object of the present invention is to provide a method for manufacturing a thin film transistor which enables heat treatment aimed at improving characteristics of a gate insulating film such as lowering of an interface level or reduction in a fixed charge without causing a problem of misalignment...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KAYOIJI HIROKI, AKIMOTO KENGO, YAMAGUCHI TETSUJI, TAKAYAMA TORU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!