Illumination system, lithographic apparatus and method

An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of...

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1. Verfasser: TYCHKOV ANDREY SERGEEVICH
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creator TYCHKOV ANDREY SERGEEVICH
description An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a first optical channel having a first optical power and a second lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a second optical channel having a second optical power, such that a radiation sub-beam formed by the first optical channel has a first cross-sectional area and shape at the pupil plane and a radiation sub-beam formed by the second optical channel has a second different cross-sectional area and/or shape at the pupil plane.
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subjects ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Illumination system, lithographic apparatus and method
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