Illumination system, lithographic apparatus and method
An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of...
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creator | TYCHKOV ANDREY SERGEEVICH |
description | An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a first optical channel having a first optical power and a second lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a second optical channel having a second optical power, such that a radiation sub-beam formed by the first optical channel has a first cross-sectional area and shape at the pupil plane and a radiation sub-beam formed by the second optical channel has a second different cross-sectional area and/or shape at the pupil plane. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9360762B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9360762B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9360762B23</originalsourceid><addsrcrecordid>eNrjZDDzzMkpzc3MSyzJzM9TKK4sLknN1VHIySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1HITQVKpfAwsKYl5hSn8kJpbgYFN9cQZw_d1IL8-NTigsTk1LzUkvjQYEtjMwNzMyMnI2MilAAAiYAt2g</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Illumination system, lithographic apparatus and method</title><source>esp@cenet</source><creator>TYCHKOV ANDREY SERGEEVICH</creator><creatorcontrib>TYCHKOV ANDREY SERGEEVICH</creatorcontrib><description>An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a first optical channel having a first optical power and a second lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a second optical channel having a second optical power, such that a radiation sub-beam formed by the first optical channel has a first cross-sectional area and shape at the pupil plane and a radiation sub-beam formed by the second optical channel has a second different cross-sectional area and/or shape at the pupil plane.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160607&DB=EPODOC&CC=US&NR=9360762B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160607&DB=EPODOC&CC=US&NR=9360762B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TYCHKOV ANDREY SERGEEVICH</creatorcontrib><title>Illumination system, lithographic apparatus and method</title><description>An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a first optical channel having a first optical power and a second lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a second optical channel having a second optical power, such that a radiation sub-beam formed by the first optical channel has a first cross-sectional area and shape at the pupil plane and a radiation sub-beam formed by the second optical channel has a second different cross-sectional area and/or shape at the pupil plane.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDzzMkpzc3MSyzJzM9TKK4sLknN1VHIySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1HITQVKpfAwsKYl5hSn8kJpbgYFN9cQZw_d1IL8-NTigsTk1LzUkvjQYEtjMwNzMyMnI2MilAAAiYAt2g</recordid><startdate>20160607</startdate><enddate>20160607</enddate><creator>TYCHKOV ANDREY SERGEEVICH</creator><scope>EVB</scope></search><sort><creationdate>20160607</creationdate><title>Illumination system, lithographic apparatus and method</title><author>TYCHKOV ANDREY SERGEEVICH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9360762B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>TYCHKOV ANDREY SERGEEVICH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TYCHKOV ANDREY SERGEEVICH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Illumination system, lithographic apparatus and method</title><date>2016-06-07</date><risdate>2016</risdate><abstract>An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a first optical channel having a first optical power and a second lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a second optical channel having a second optical power, such that a radiation sub-beam formed by the first optical channel has a first cross-sectional area and shape at the pupil plane and a radiation sub-beam formed by the second optical channel has a second different cross-sectional area and/or shape at the pupil plane.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | Illumination system, lithographic apparatus and method |
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