Methanofullerenes

The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation,...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	XUE XIANG, PALMER RICHARD EDWARD, ATHANS DREW, FROMMHOLD ANDREAS, MCCLELLAND ALEXANDRA, ROBINSON ALEX PHILIP GRAHAM, PREECE JON ANDREW, YANG DONGXU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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