Methanofullerenes
The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation,...
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| creator | XUE XIANG PALMER RICHARD EDWARD ATHANS DREW FROMMHOLD ANDREAS MCCLELLAND ALEXANDRA ROBINSON ALEX PHILIP GRAHAM PREECE JON ANDREW YANG DONGXU |
| description | The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9323149B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9323149B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9323149B23</originalsourceid><addsrcrecordid>eNrjZBD0TS3JSMzLTyvNyUktSs1LLeZhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJQFUl8aHBlsZGxoYmlk5GxkQoAQC-SR_J</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Methanofullerenes</title><source>esp@cenet</source><creator>XUE XIANG ; PALMER RICHARD EDWARD ; ATHANS DREW ; FROMMHOLD ANDREAS ; MCCLELLAND ALEXANDRA ; ROBINSON ALEX PHILIP GRAHAM ; PREECE JON ANDREW ; YANG DONGXU</creator><creatorcontrib>XUE XIANG ; PALMER RICHARD EDWARD ; ATHANS DREW ; FROMMHOLD ANDREAS ; MCCLELLAND ALEXANDRA ; ROBINSON ALEX PHILIP GRAHAM ; PREECE JON ANDREW ; YANG DONGXU</creatorcontrib><description>The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160426&DB=EPODOC&CC=US&NR=9323149B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160426&DB=EPODOC&CC=US&NR=9323149B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>XUE XIANG</creatorcontrib><creatorcontrib>PALMER RICHARD EDWARD</creatorcontrib><creatorcontrib>ATHANS DREW</creatorcontrib><creatorcontrib>FROMMHOLD ANDREAS</creatorcontrib><creatorcontrib>MCCLELLAND ALEXANDRA</creatorcontrib><creatorcontrib>ROBINSON ALEX PHILIP GRAHAM</creatorcontrib><creatorcontrib>PREECE JON ANDREW</creatorcontrib><creatorcontrib>YANG DONGXU</creatorcontrib><title>Methanofullerenes</title><description>The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBD0TS3JSMzLTyvNyUktSs1LLeZhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJQFUl8aHBlsZGxoYmlk5GxkQoAQC-SR_J</recordid><startdate>20160426</startdate><enddate>20160426</enddate><creator>XUE XIANG</creator><creator>PALMER RICHARD EDWARD</creator><creator>ATHANS DREW</creator><creator>FROMMHOLD ANDREAS</creator><creator>MCCLELLAND ALEXANDRA</creator><creator>ROBINSON ALEX PHILIP GRAHAM</creator><creator>PREECE JON ANDREW</creator><creator>YANG DONGXU</creator><scope>EVB</scope></search><sort><creationdate>20160426</creationdate><title>Methanofullerenes</title><author>XUE XIANG ; PALMER RICHARD EDWARD ; ATHANS DREW ; FROMMHOLD ANDREAS ; MCCLELLAND ALEXANDRA ; ROBINSON ALEX PHILIP GRAHAM ; PREECE JON ANDREW ; YANG DONGXU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9323149B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>XUE XIANG</creatorcontrib><creatorcontrib>PALMER RICHARD EDWARD</creatorcontrib><creatorcontrib>ATHANS DREW</creatorcontrib><creatorcontrib>FROMMHOLD ANDREAS</creatorcontrib><creatorcontrib>MCCLELLAND ALEXANDRA</creatorcontrib><creatorcontrib>ROBINSON ALEX PHILIP GRAHAM</creatorcontrib><creatorcontrib>PREECE JON ANDREW</creatorcontrib><creatorcontrib>YANG DONGXU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>XUE XIANG</au><au>PALMER RICHARD EDWARD</au><au>ATHANS DREW</au><au>FROMMHOLD ANDREAS</au><au>MCCLELLAND ALEXANDRA</au><au>ROBINSON ALEX PHILIP GRAHAM</au><au>PREECE JON ANDREW</au><au>YANG DONGXU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methanofullerenes</title><date>2016-04-26</date><risdate>2016</risdate><abstract>The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Methanofullerenes |
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