Process and materials for making contained layers and devices made with same

There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer including a fluorinated material and having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation having a wavelength greater than 300 nm, resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a patterned priming layer, wherein the patterned priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid deposition on the patterned priming layer on the first layer. The priming layer includes an aromatic amine compound and a photoinitiator.