Methods of forming a protection layer to protect a metal hard mask layer during lithography reworking processes

One method disclosed herein includes forming a layer of insulating material above a semiconductor substrate, forming a hard mask layer comprised of a metal-containing material above the layer of insulating material, forming a blanket protection layer on the hard mask layer, forming a masking layer a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	DONEGAN KEITH, SEIDEL ROBERT, HUISINGA TORSTEN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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