Inspection apparatus, lithographic apparatus, and device manufacturing method

An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A r...

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Bibliographische Detailangaben

Hauptverfasser:	SHMAREV YEVGENIY KONSTANTINOVICH, HEALD DAVID, RYZHIKOV LEV, CATEY ERIC BRIAN, JOOBEUR ADEL, JACOBS RICHARD, SMIRNOV STANISLAV Y
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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