Cooled tape frame lift and low contact shadow ring for plasma heat isolation

Methods of and apparatuses for dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. In an example, a tape frame lift assembly for a plasma processing chamber includes a capture single ring having an upper surface for supporting a tape frame of a substrate...

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Bibliographische Detailangaben
1. Verfasser: OUYE ALAN HIROSHI
Format: Patent
Sprache:eng
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