Apparatus for preparing relief printing form
The invention provides an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The apparatus in...
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| creator | PERROTTO JOSEPH ANTHONY PATEL DHIREN V MCMILLEN ROBERT A RUDOLPH MICHAEL LEE |
| description | The invention provides an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The apparatus includes means for exposing a photosensitive element having an in-situ mask to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas. |
| format | Patent |
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More specifically, this invention describes an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The apparatus includes means for exposing a photosensitive element having an in-situ mask to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BLASTING ; CINEMATOGRAPHY ; DRYING ; DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ; ELECTROGRAPHY ; HEATING ; HOLOGRAPHY ; LIGHTING ; MATERIALS THEREFOR ; MECHANICAL ENGINEERING ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; WEAPONS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151201&DB=EPODOC&CC=US&NR=9201314B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151201&DB=EPODOC&CC=US&NR=9201314B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PERROTTO JOSEPH ANTHONY</creatorcontrib><creatorcontrib>PATEL DHIREN V</creatorcontrib><creatorcontrib>MCMILLEN ROBERT A</creatorcontrib><creatorcontrib>RUDOLPH MICHAEL LEE</creatorcontrib><title>Apparatus for preparing relief printing form</title><description>The invention provides an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The apparatus includes means for exposing a photosensitive element having an in-situ mask to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BLASTING</subject><subject>CINEMATOGRAPHY</subject><subject>DRYING</subject><subject>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</subject><subject>ELECTROGRAPHY</subject><subject>HEATING</subject><subject>HOLOGRAPHY</subject><subject>LIGHTING</subject><subject>MATERIALS THEREFOR</subject><subject>MECHANICAL ENGINEERING</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBxLChILEosKS1WSMsvUigoSgVyM_PSFYpSczJT04ACmXklID5QNpeHgTUtMac4lRdKczMouLmGOHvophbkx6cWFyQmp-allsSHBlsaGRgaG5o4GRkToQQAZF0pww</recordid><startdate>20151201</startdate><enddate>20151201</enddate><creator>PERROTTO JOSEPH ANTHONY</creator><creator>PATEL DHIREN V</creator><creator>MCMILLEN ROBERT A</creator><creator>RUDOLPH MICHAEL LEE</creator><scope>EVB</scope></search><sort><creationdate>20151201</creationdate><title>Apparatus for preparing relief printing form</title><author>PERROTTO JOSEPH ANTHONY ; PATEL DHIREN V ; MCMILLEN ROBERT A ; RUDOLPH MICHAEL LEE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9201314B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BLASTING</topic><topic>CINEMATOGRAPHY</topic><topic>DRYING</topic><topic>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</topic><topic>ELECTROGRAPHY</topic><topic>HEATING</topic><topic>HOLOGRAPHY</topic><topic>LIGHTING</topic><topic>MATERIALS THEREFOR</topic><topic>MECHANICAL ENGINEERING</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>PERROTTO JOSEPH ANTHONY</creatorcontrib><creatorcontrib>PATEL DHIREN V</creatorcontrib><creatorcontrib>MCMILLEN ROBERT A</creatorcontrib><creatorcontrib>RUDOLPH MICHAEL LEE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PERROTTO JOSEPH ANTHONY</au><au>PATEL DHIREN V</au><au>MCMILLEN ROBERT A</au><au>RUDOLPH MICHAEL LEE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus for preparing relief printing form</title><date>2015-12-01</date><risdate>2015</risdate><abstract>The invention provides an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The apparatus includes means for exposing a photosensitive element having an in-situ mask to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BLASTING CINEMATOGRAPHY DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTROGRAPHY HEATING HOLOGRAPHY LIGHTING MATERIALS THEREFOR MECHANICAL ENGINEERING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS WEAPONS |
| title | Apparatus for preparing relief printing form |
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