Method and system for thermally conditioning an optical element

A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providin...

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Hauptverfasser: VAN DER GRAAF FREDERIK, POTTS CHARLES WILLIAM BARRAS, SCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS, NIEUWKOOP EVERT, LEMMEN MARTINUS HENRICUS JOHANNES, JANSSEN FRANCISCUS JOHANNES JOSEPH, VAN HELDEN WILLEM ARIE, LEXMOND AXEL SEBASTIAAN, VELTHUIS JOHANNES FRANSISCUS MARIA, VERSLUIS RICHARD, SCHAAREMAN PAULUS BARTHOLOMEUS JOHANNES, VAN EMPEL TJARKO ADRIAAN RUDOLF, CHENG LUN, MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS, DE KROON MATHILDE GERTRUDIS MARIA
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creator VAN DER GRAAF FREDERIK
POTTS CHARLES WILLIAM BARRAS
SCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS
NIEUWKOOP EVERT
LEMMEN MARTINUS HENRICUS JOHANNES
JANSSEN FRANCISCUS JOHANNES JOSEPH
VAN HELDEN WILLEM ARIE
LEXMOND AXEL SEBASTIAAN
VELTHUIS JOHANNES FRANSISCUS MARIA
VERSLUIS RICHARD
SCHAAREMAN PAULUS BARTHOLOMEUS JOHANNES
VAN EMPEL TJARKO ADRIAAN RUDOLF
CHENG LUN
MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS
DE KROON MATHILDE GERTRUDIS MARIA
description A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9176398B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9176398B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9176398B23</originalsourceid><addsrcrecordid>eNrjZLD3TS3JyE9RSMxLUSiuLC5JzVVIyy9SKMlILcpNzMmpVEjOz0vJLMnMz8vMSweqUsgvKMlMTsxRSM1JzU3NK-FhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGhwZaG5mbGlhZORsZEKAEAUEAxCg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method and system for thermally conditioning an optical element</title><source>esp@cenet</source><creator>VAN DER GRAAF FREDERIK ; POTTS CHARLES WILLIAM BARRAS ; SCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS ; NIEUWKOOP EVERT ; LEMMEN MARTINUS HENRICUS JOHANNES ; JANSSEN FRANCISCUS JOHANNES JOSEPH ; VAN HELDEN WILLEM ARIE ; LEXMOND AXEL SEBASTIAAN ; VELTHUIS JOHANNES FRANSISCUS MARIA ; VERSLUIS RICHARD ; SCHAAREMAN PAULUS BARTHOLOMEUS JOHANNES ; VAN EMPEL TJARKO ADRIAAN RUDOLF ; CHENG LUN ; MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ; DE KROON MATHILDE GERTRUDIS MARIA</creator><creatorcontrib>VAN DER GRAAF FREDERIK ; POTTS CHARLES WILLIAM BARRAS ; SCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS ; NIEUWKOOP EVERT ; LEMMEN MARTINUS HENRICUS JOHANNES ; JANSSEN FRANCISCUS JOHANNES JOSEPH ; VAN HELDEN WILLEM ARIE ; LEXMOND AXEL SEBASTIAAN ; VELTHUIS JOHANNES FRANSISCUS MARIA ; VERSLUIS RICHARD ; SCHAAREMAN PAULUS BARTHOLOMEUS JOHANNES ; VAN EMPEL TJARKO ADRIAAN RUDOLF ; CHENG LUN ; MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ; DE KROON MATHILDE GERTRUDIS MARIA</creatorcontrib><description>A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; GAMMA RAY OR X-RAY MICROSCOPES ; HOLOGRAPHY ; IRRADIATION DEVICES ; MATERIALS THEREFOR ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20151103&amp;DB=EPODOC&amp;CC=US&amp;NR=9176398B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20151103&amp;DB=EPODOC&amp;CC=US&amp;NR=9176398B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN DER GRAAF FREDERIK</creatorcontrib><creatorcontrib>POTTS CHARLES WILLIAM BARRAS</creatorcontrib><creatorcontrib>SCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS</creatorcontrib><creatorcontrib>NIEUWKOOP EVERT</creatorcontrib><creatorcontrib>LEMMEN MARTINUS HENRICUS JOHANNES</creatorcontrib><creatorcontrib>JANSSEN FRANCISCUS JOHANNES JOSEPH</creatorcontrib><creatorcontrib>VAN HELDEN WILLEM ARIE</creatorcontrib><creatorcontrib>LEXMOND AXEL SEBASTIAAN</creatorcontrib><creatorcontrib>VELTHUIS JOHANNES FRANSISCUS MARIA</creatorcontrib><creatorcontrib>VERSLUIS RICHARD</creatorcontrib><creatorcontrib>SCHAAREMAN PAULUS BARTHOLOMEUS JOHANNES</creatorcontrib><creatorcontrib>VAN EMPEL TJARKO ADRIAAN RUDOLF</creatorcontrib><creatorcontrib>CHENG LUN</creatorcontrib><creatorcontrib>MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS</creatorcontrib><creatorcontrib>DE KROON MATHILDE GERTRUDIS MARIA</creatorcontrib><title>Method and system for thermally conditioning an optical element</title><description>A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>GAMMA RAY OR X-RAY MICROSCOPES</subject><subject>HOLOGRAPHY</subject><subject>IRRADIATION DEVICES</subject><subject>MATERIALS THEREFOR</subject><subject>NUCLEAR ENGINEERING</subject><subject>NUCLEAR PHYSICS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD3TS3JyE9RSMxLUSiuLC5JzVVIyy9SKMlILcpNzMmpVEjOz0vJLMnMz8vMSweqUsgvKMlMTsxRSM1JzU3NK-FhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGhwZaG5mbGlhZORsZEKAEAUEAxCg</recordid><startdate>20151103</startdate><enddate>20151103</enddate><creator>VAN DER GRAAF FREDERIK</creator><creator>POTTS CHARLES WILLIAM BARRAS</creator><creator>SCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS</creator><creator>NIEUWKOOP EVERT</creator><creator>LEMMEN MARTINUS HENRICUS JOHANNES</creator><creator>JANSSEN FRANCISCUS JOHANNES JOSEPH</creator><creator>VAN HELDEN WILLEM ARIE</creator><creator>LEXMOND AXEL SEBASTIAAN</creator><creator>VELTHUIS JOHANNES FRANSISCUS MARIA</creator><creator>VERSLUIS RICHARD</creator><creator>SCHAAREMAN PAULUS BARTHOLOMEUS JOHANNES</creator><creator>VAN EMPEL TJARKO ADRIAAN RUDOLF</creator><creator>CHENG LUN</creator><creator>MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS</creator><creator>DE KROON MATHILDE GERTRUDIS MARIA</creator><scope>EVB</scope></search><sort><creationdate>20151103</creationdate><title>Method and system for thermally conditioning an optical element</title><author>VAN DER GRAAF FREDERIK ; POTTS CHARLES WILLIAM BARRAS ; SCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS ; NIEUWKOOP EVERT ; LEMMEN MARTINUS HENRICUS JOHANNES ; JANSSEN FRANCISCUS JOHANNES JOSEPH ; VAN HELDEN WILLEM ARIE ; LEXMOND AXEL SEBASTIAAN ; VELTHUIS JOHANNES FRANSISCUS MARIA ; VERSLUIS RICHARD ; SCHAAREMAN PAULUS BARTHOLOMEUS JOHANNES ; VAN EMPEL TJARKO ADRIAAN RUDOLF ; CHENG LUN ; MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ; DE KROON MATHILDE GERTRUDIS MARIA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9176398B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>GAMMA RAY OR X-RAY MICROSCOPES</topic><topic>HOLOGRAPHY</topic><topic>IRRADIATION DEVICES</topic><topic>MATERIALS THEREFOR</topic><topic>NUCLEAR ENGINEERING</topic><topic>NUCLEAR PHYSICS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN DER GRAAF FREDERIK</creatorcontrib><creatorcontrib>POTTS CHARLES WILLIAM BARRAS</creatorcontrib><creatorcontrib>SCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS</creatorcontrib><creatorcontrib>NIEUWKOOP EVERT</creatorcontrib><creatorcontrib>LEMMEN MARTINUS HENRICUS JOHANNES</creatorcontrib><creatorcontrib>JANSSEN FRANCISCUS JOHANNES JOSEPH</creatorcontrib><creatorcontrib>VAN HELDEN WILLEM ARIE</creatorcontrib><creatorcontrib>LEXMOND AXEL SEBASTIAAN</creatorcontrib><creatorcontrib>VELTHUIS JOHANNES FRANSISCUS MARIA</creatorcontrib><creatorcontrib>VERSLUIS RICHARD</creatorcontrib><creatorcontrib>SCHAAREMAN PAULUS BARTHOLOMEUS JOHANNES</creatorcontrib><creatorcontrib>VAN EMPEL TJARKO ADRIAAN RUDOLF</creatorcontrib><creatorcontrib>CHENG LUN</creatorcontrib><creatorcontrib>MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS</creatorcontrib><creatorcontrib>DE KROON MATHILDE GERTRUDIS MARIA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN DER GRAAF FREDERIK</au><au>POTTS CHARLES WILLIAM BARRAS</au><au>SCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS</au><au>NIEUWKOOP EVERT</au><au>LEMMEN MARTINUS HENRICUS JOHANNES</au><au>JANSSEN FRANCISCUS JOHANNES JOSEPH</au><au>VAN HELDEN WILLEM ARIE</au><au>LEXMOND AXEL SEBASTIAAN</au><au>VELTHUIS JOHANNES FRANSISCUS MARIA</au><au>VERSLUIS RICHARD</au><au>SCHAAREMAN PAULUS BARTHOLOMEUS JOHANNES</au><au>VAN EMPEL TJARKO ADRIAAN RUDOLF</au><au>CHENG LUN</au><au>MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS</au><au>DE KROON MATHILDE GERTRUDIS MARIA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and system for thermally conditioning an optical element</title><date>2015-11-03</date><risdate>2015</risdate><abstract>A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.</abstract><oa>free_for_read</oa></addata></record>
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subjects ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
GAMMA RAY OR X-RAY MICROSCOPES
HOLOGRAPHY
IRRADIATION DEVICES
MATERIALS THEREFOR
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
title Method and system for thermally conditioning an optical element
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-12T18%3A48%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=VAN%20DER%20GRAAF%20FREDERIK&rft.date=2015-11-03&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS9176398B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true