Scatterometry metrology methods and methods of modeling formation of a vertical region of a multilayer semiconductor substrate to comprise a scatterometry target

A scatterometry target formed relative to an elevationally outermost surface of a substrate includes features having an optical property that is different from that of spaces between the features. The substrate has spaced-apart parallel elongated blocking lines having an optical property different f...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ENGELHARD DANIEL E, HINES DANIELLE, MING FAN
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!