Thin-film semiconductor device and method of manufacturing the same

A thin-film semiconductor device manufacturing method according to the present disclosure includes: preparing a substrate; forming a gate electrode above the substrate; forming a gate insulating film above the substrate; forming an amorphous film (amorphous silicon film) above the substrate; forming...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KAWASHIMA TAKAHIRO, YOSHIOKA HIROSHI, OOTAKA SEI, NISHITANI HIKARU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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